SCHEMBL2293353

SCHEMBL2293353

COc1ccccc1[Si](C)(C)OC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.52
CA2 P00918 3/20 0.52
CA7 P43166 2/20 0.52
CA9 Q16790 2/20 0.52
CA12 O43570 1/20 0.52
CA4 P22748 1/20 0.52
CA14 Q9ULX7 1/20 0.52
ALDH1A1 P00352 6/20 0.43
TP53 P04637 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
TSHR P16473 1/20 0.43
ADRA2B P18089 1/20 0.43
PTGS1 P23219 1/20 0.43
MAPK1 P28482 2/20 0.41
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ENPP2 Q13822 1/20 0.40
NQO2 P16083 3/20 0.39
ORAI1 Q96D31 1/20 0.39
ORAI2 Q96SN7 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2961092 0.83 CA4 (0.36) CA1CA2CA7CA9CA12
SCHEMBL27707263 0.82 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL3678596 0.81 CA1 (0.57) CA1CA2CA7CA9CA12
SCHEMBL2191561 0.81 CA1 (0.57) CA1CA2CA7CA9CA12
SCHEMBL16487320 0.79 ALDH1A1 (0.45) CA4ALDH1A1TSHRMAPK1HTT
SCHEMBL1971497 0.79 CA1 (0.55) CA1CA2CA7CA9CA12
SCHEMBL19181561 0.78 CA1 (0.60) CA1CA2CA7CA9CA12
SCHEMBL16167037 0.77 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL3157656 0.77 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL5090372 0.77 CA1 (0.52) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12002988-B2 Porous film including porous base and porous layer having inorganic particles and resin particles containing fluoro (meth)acrylate-containing or silicon-containing polymer, separator for secondary batteries, and secondary battery TORAY INDUSTRIES, INC. (JP) 2024-06-04 US disclosed
CN-112969578-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2024-02-09 CN disclosed
US-20220013861-A1 POROUS FILM, SEPARATOR FOR SECONDARY BATTERIES, AND SECONDARY BATTERY TORAY INDUSTRIES, INC. (JP) 2022-01-13 US disclosed
EP-3885127-A1 POROUS FILM, SECONDARY BATTERY SEPARATOR, AND SECONDARY BATTERY Toray Industries, Inc. (JP) 2021-09-29 EP disclosed
CN-112969578-A Porous film, secondary battery separator, and secondary battery 东丽株式会社 2021-06-15 CN disclosed
US-20130217236-A1 SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING THE SEMICONDUCTOR DEVICE, SUBSTRATE FOR SEMICONDUCTOR ELEMENT AND METHOD FOR PRODUCING THE SUBSTRATE FUJIFILM CORPORATION (JP) 2013-08-22 US disclosed
US-20110193103-A1 SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING THE SEMICONDUCTOR DEVICE, SUBSTRATE FOR SEMICONDUCTOR ELEMENT AND METHOD FOR PRODUCING THE SUBSTRATE FUJIFILM CORPORATION (JP) 2011-08-11 US disclosed
EP-2355141-A2 Semiconductor device, method for producing the semiconductor device, substrate for semiconductor element and method for producing the substrate Fujifilm Corporation (JP) 2011-08-10 EP disclosed
EP-0391447-B1 Method for production of inorganic oxide particles NIPPON CATALYTIC CHEM IND (JP) 1994-11-30 EP disclosed
US-5139980-A Adding a hydrolyzable and condensable metal compound to oxide seed particles having an alkylene glycol bonded to its surface NIPPON SHOKUBAI KAGAKU KOGYO CO., LTD. (JP) 1992-08-18 US disclosed
EP-0391447-A2 Method for production of inorganic oxide particles NIPPON SHOKUBAI KAGAKU KOGYO CO. LTD. (JP) 1990-10-10 EP disclosed