SCHEMBL27707263

SCHEMBL27707263

COc1ccccc1[Si](C)(OC)OC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.52
CA2 P00918 3/20 0.52
CA7 P43166 2/20 0.52
CA9 Q16790 2/20 0.52
CA12 O43570 1/20 0.52
CA4 P22748 1/20 0.52
CA14 Q9ULX7 1/20 0.52
ALDH1A1 P00352 6/20 0.43
TP53 P04637 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
TSHR P16473 1/20 0.43
ADRA2B P18089 1/20 0.43
PTGS1 P23219 1/20 0.43
MAPK1 P28482 2/20 0.41
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ENPP2 Q13822 1/20 0.40
NQO2 P16083 3/20 0.39
ORAI1 Q96D31 1/20 0.39
ORAI2 Q96SN7 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30473475 0.83 CA4 (0.36) CA1CA2CA7CA9CA12
SCHEMBL1639954 0.83 CA4 (0.36) CA1CA2CA7CA9CA12
SCHEMBL2293353 0.82 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL5090372 0.82 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL3678596 0.81 CA1 (0.57) CA1CA2CA7CA9CA12
SCHEMBL2191561 0.81 CA1 (0.57) CA1CA2CA7CA9CA12
SCHEMBL8999364 0.79 ALDH1A1 (0.45) CA4ALDH1A1TSHRMAPK1HTT
SCHEMBL27707274 0.79 CA1 (0.44) CA1CA2CA7CA9CA12
SCHEMBL1971497 0.79 CA1 (0.55) CA1CA2CA7CA9CA12
SCHEMBL19181561 0.78 CA1 (0.60) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107076894-A Infrared shielding composition, cured film, and solid-state imaging device JSR株式会社 2017-08-18 CN disclosed
CN-101133364-B Composition for resist underlayer film and method for producing same JSR CORP 2013-03-20 CN disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed