SCHEMBL2307573

SCHEMBL2307573

CCCCCCCCCC1(c2ccccc2)CO1

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 5/20 0.47
MMP9 P14780 5/20 0.47
MMP3 P08254 1/20 0.47
OPRM1 P35372 4/20 0.41
OPRL1 P41146 4/20 0.41
MMP8 P22894 2/20 0.40
MMP13 P45452 2/20 0.40
OPRD1 P41143 1/20 0.39
OPRK1 P41145 1/20 0.39
EPHX2 P34913 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL379441 1.00 MMP2 (0.47) MMP2MMP9MMP3OPRM1OPRL1
SCHEMBL27997493 1.00 MMP2 (0.47) MMP2MMP9MMP3OPRM1OPRL1
SCHEMBL8333912 0.98 MMP2 (0.46) MMP2MMP9MMP3OPRM1OPRL1
SCHEMBL11140706 0.93 OPRM1 (0.46) MMP2MMP9MMP3OPRM1OPRL1
Phosphoric Acid SCHEMBL9404069 0.91 MMP2 (0.44) MMP2MMP9MMP3EPHX2
Guanidine SCHEMBL9509189 0.91 MMP2 (0.41) MMP2MMP9MMP3OPRM1OPRL1
SCHEMBL27885042 0.85 KDM1A (0.38) OPRM1OPRL1OPRK1
SCHEMBL10812665 0.85 KDM1A (0.38) OPRM1OPRL1OPRK1
Water SCHEMBL28147213 0.81 MMP2 (0.41) MMP2MMP9MMP3OPRM1OPRL1
SCHEMBL27541138 0.79 MMP2 (0.42) MMP2MMP9MMP3OPRM1OPRL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1594375-A Chloridized modified acrylic resin and preparation process thereof HUBEI SHUANGHUAN CHEMICAL GROU (CN) 2005-03-16 CN claimed
US-6281189-B1 Soyate containing compositions ELISHA TECHNOLOGIES CO LLC 2001-08-28 US claimed
CN-1052502-C Composition and method for polishing and planing surfaces RODER CO LTD (US) 2000-05-17 CN claimed
EP-0690772-B1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL INC (US) 1998-05-13 EP claimed
EP-0690772-A1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL, INC. (US) 1996-01-10 EP claimed
EP-0690772-A4 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL INC (US) 1995-06-01 EP claimed
US-5264010-A An abrasive consists of cerium oxide, fumed and precipitated silica and surfactants; abrasion RODEL, INC. (US) 1993-11-23 US claimed
WO-1993022103-A1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL, INC. (US) 1993-11-11 WO claimed
CN-1077974-A Composition and method for polishing and planing surfaces RODER CO LTD (US) 1993-11-03 CN claimed
US-3935260-A Auto-condensation products of urea AFRICAN EXPLOSIVES & CHEMICAL INDUSTRIES LIMITED (ZA) 1976-01-27 US claimed
JP-62187796-A None JP disclosed
JP-8218066-A None JP disclosed
US-9005512-B2 Method for forming patterns and method for producing patterned substrates FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed
EP-2351799-B1 ENERGY BEAM-CURING INKJET INK COMPOSITION HITACHI MAXELL (JP) 2014-12-31 EP disclosed
US-20130032971-A1 METHOD FOR FORMING PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES FUJIFILM CORPORATION (JP) 2013-02-07 US disclosed
US-4177303-A Method of galvanizing a portion only of a ferrous metal article DOMINION FOUNDRIES AND STEEL, LIMITED (CA) 1979-12-04 US disclosed
US-4076768-A BUTADIENE-STYRENE COPOLYMER THE DOW CHEMICAL COMPANY (US) 1978-02-28 US disclosed
US-4043765-A CELLULOSE, PETROLEUM FUEL LINWO INDUSTRIES LTD. (CA) 1977-08-23 US disclosed
US-3936365-A Radiation crosslinked block copolymer blends with improved impact resistance THE DOW CHEMICAL COMPANY (US) 1976-02-03 US disclosed
US-3935260-A Auto-condensation products of urea AFRICAN EXPLOSIVES & CHEMICAL INDUSTRIES LIMITED (ZA) 1976-01-27 US disclosed