⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9845415 | 1.00 | — | — | |
| SCHEMBL21359830 | 0.89 | — | — | |
| SCHEMBL11745979 | 0.84 | — | — | |
| SCHEMBL20500123 | 0.79 | — | — | |
| SCHEMBL431586 | 0.75 | — | — | |
| SCHEMBL329203 | 0.75 | HTT (0.32) | — | |
| SCHEMBL28242776 | 0.75 | — | — | |
| SCHEMBL1448901 | 0.75 | HTT (0.32) | — | |
| SCHEMBL23444138 | 0.75 | CA12 (0.33) | — | |
| SCHEMBL5141322 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3588 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260139200-A1 | COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION | FUJIFILM ELECTRONIC MAT U S A INC (US) | 2026-05-21 | — | — | US | claimed |
| US-20260110963-A1 | PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE | INST OPTICS & ELECTRONICS CAS (CN) | 2026-04-23 | — | — | US | claimed |
| US-12603321-B2 | Battery separators, electrodes, cells, lithium batteries and related methods | CELGARD, LLC (US) | 2026-04-14 | — | — | US | claimed |
| US-20260101682-A1 | SELECTIVE DEPOSITION METHOD OF THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | HONGIK UNIVERSITY INDUSTRY-ACADEMIA COOPERATION FOUNDATION (KR) | 2026-04-09 | — | — | US | claimed |
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | claimed |
| US-12557370-B2 | Semiconductor device manufacturing method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| US-12534799-B2 | Multilayer hydrophobic film | SPTS TECHNOLOGIES LTD. (GB) | 2026-01-27 | — | — | US | claimed |
| WO-2025245366-A1 | COMPOSITIONS, METHODS, AND SYSTEMS FOR CARBON CAPTURE | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2025-11-27 | — | — | WO | claimed |
| US-20250311261-A1 | METHOD FOR SEMICONDUCTOR PROCESSING | TOKYO ELECTRON LIMITED (JP) | 2025-10-02 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| US-4814407-A | A SILANOL, SILANEDIOL OR SILANETRIOL AND AN ACID SCAVENGER | PCR, INC. (US) | 1989-03-21 | — | — | US | claimed |
| EP-0265619-A2 | Planarization through silylation | International Business Machines Corporation (US) | 1988-05-04 | — | — | EP | claimed |
| EP-0248779-A1 | Process for producing positive patterns in a photoresist layer | U C B, S.A. (BE) | 1987-12-09 | — | — | EP | claimed |
| EP-0184567-A1 | Process for the formation of negative patterns in a photoresist layer | UCB Electronics, S.A. (BE) | 1986-06-11 | — | — | EP | claimed |
| US-4412073-A | Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1983-10-25 | — | — | US | claimed |
| US-4029883-A | Dehydroxylation of aminosugars | TAKEDA CHEMICAL INDUSTRIES, LTD. (JA) | 1977-06-14 | — | — | US | claimed |
| US-4020269-A | Epiminodeaminodeoxyaminoglycoside antibiotics and intermediates | TAKEDA CHEMICAL INDUSTRIES, LTD. (JA) | 1977-04-26 | — | — | US | claimed |
| US-3983114-A | Method of preparation of 6-aza uracile and its O-disilyl derivative | NOBEL HOECHST CHIMIE (FR) | 1976-09-28 | — | — | US | claimed |
| US-3944545-A | Process for preparing desacetoxycephalosporins | ELI LILLY AND COMPANY (US) | 1976-03-16 | — | — | US | claimed |