SCHEMBL431586

SCHEMBL431586

CCN(CC)[Si](C)(N(CC)CC)N(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2103188 0.82
SCHEMBL2101775 0.82
SCHEMBL28242776 0.75
SCHEMBL1448901 0.75 HTT (0.32)
SCHEMBL9845415 0.75
SCHEMBL230819 0.75
SCHEMBL329203 0.75 HTT (0.32)
SCHEMBL359593 0.73 MGLL (0.31)
SCHEMBL4785835 0.69
SCHEMBL9157805 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11631580-B2 Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials VERSUM MATERIALS US, LLC (US) 2023-04-18 US claimed
CN-110573651-B Formulations for depositing silicon doped hafnium oxide as ferroelectric material 弗萨姆材料美国有限责任公司 2022-07-22 CN claimed
US-20220189767-A1 FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS VERSUM MATERIALS US, LLC (US) 2022-06-16 US claimed
US-11081337-B2 Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials Versum Materials U.S., LLC (US) 2021-08-03 US claimed
US-10702467-B2 Emulsion containing organosilicon-based portions of hollow spheres L'ORÉAL (FR) 2020-07-07 US claimed
CN-110573651-A Novel formulations for the deposition of silicon-doped hafnium oxide as ferroelectric material 弗萨姆材料美国有限责任公司 2019-12-13 CN claimed
WO-2018170126-A1 NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
US-20180269057-A1 Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials VERSUM MATERIALS US, LLC (US) 2018-09-20 US claimed
US-20170304183-A1 EMULSION CONTAINING ORGANOSILICON-BASED PORTIONS OF HOLLOW SPHERES L'ORÉAL (FR) 2017-10-26 US claimed
US-9622946-B2 Emulsion containing organosilicon-based portions of hollow spheres L'OREAL (FR) 2017-04-18 US claimed
US-6706798-B2 IMPROVED FLOWABILITY/VISCOSITY; POLYSILOXANE RENDERED HYDROPHOBIC BY SURFACE TREATMENT WITH HEXAMETHYLDISILAZANE DOW CORNING TORAY SILICONE CO., LTD. (JP) 2004-03-16 US claimed
US-20020077412-A1 Water repellent silicone coating agent composition DOW CORNING TORAY SILICONE COMPANY, LIMITED (JP) 2002-06-20 US claimed
EP-1215252-A2 Water repellent silicone coating agent composition Dow Corning Toray Silicone Co., Ltd. (JP) 2002-06-19 EP claimed
CN-1345464-A Application of multifunctional silicon-based oligomer/polymer nano-pore silica film in surface modification ALLIED SIGNAL INC (US) 2002-04-17 CN claimed
US-20020001973-A1 Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films WU HUI-JUNG (US) 2002-01-03 US claimed
EP-1153426-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS AlliedSignal Inc. (US) 2001-11-14 EP claimed
WO-2000044036-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS ALLIEDSIGNAL INC. (US) 2000-07-27 WO claimed
US-5679463-A POLYDIMETHYLSILOXANE ELASTOMER; THERMOCONDUCTIVITY; ELECTROSTATOGRAPHIC FUSING EASTMAN KODAK COMPANY (US) 1997-10-21 US claimed
EP-0566936-B1 Aquatic antifouling mortar composition DOW CORNING TORAY SILICONE (JP) 1995-12-06 EP claimed
EP-0566936-A1 Aquatic antifouling mortar composition Dow Corning Toray Silicone Company, Limited (JP) 1993-10-27 EP claimed