Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | ERN1 | O75460 | 1/20 | 0.45 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.43 |
| ▸ | TUBB | P07437 | 1/20 | 0.43 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.43 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.43 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.43 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.43 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.43 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.43 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.43 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.43 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16920395 | 0.89 | CYP1A2 (0.50) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL599396 | 0.86 | ALDH1A1 (0.67) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL30949367 | 0.86 | ALDH1A1 (0.67) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL29118946 | 0.82 | ALDH1A1 (0.56) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL27861347 | 0.81 | ALDH1A1 (0.50) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL28702859 | 0.81 | CYP1A2 (0.59) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP2A6 | |
| SCHEMBL23271811 | 0.81 | CYP2A6 (0.42) | ALDH1A1CYP2A6TDP1CYP1A2TUBB4A | |
| SCHEMBL23089898 | 0.81 | CYP2A6 (0.42) | ALDH1A1KDM4ECYP2A6TDP1CYP1A2 | |
| SCHEMBL23271740 | 0.80 | CYP2A6 (0.39) | ALDH1A1KDM4ESMN1; SMN2CYP2A6TDP1 | |
| SCHEMBL30003120 | 0.80 | CYP2A6 (0.39) | ALDH1A1KDM4ESMN1; SMN2CYP2A6TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| CN-110891980-B | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| US-11352450-B2 | Photopolymerization sensitizer composition | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| CN-111868105-B | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-04-29 | — | — | US | disclosed |
| US-20210079127-A1 | PHOTOPOLYMERIZATION SENSITIZER COMPOSITION | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-03-18 | — | — | US | disclosed |
| CN-112394617-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2021-02-23 | — | — | CN | disclosed |
| CN-111868105-A | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-111796482-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-10-20 | — | — | CN | disclosed |
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-110955114-A | Photosensitive resin composition, method for producing patterned cured film, and cured film | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |
| CN-110891980-A | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2020-03-17 | — | — | CN | disclosed |
| CN-102232065-B | Photobase generator | WAKO PURE CHEM IND LTD | 2014-11-05 | — | — | CN | disclosed |
| CN-102232065-A | Photobase generator | WAKO PURE CHEM IND LTD | 2011-11-02 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | PPOX, NOX4, CROCC | ALDH1A1 1023/4885KDM4E 1028/4885MAPK1 3189/4885 |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | PPOX, NOX4, CROCC | ALDH1A1 1023/4885KDM4E 1028/4885MAPK1 3189/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.