SCHEMBL23089936

SCHEMBL23089936

OC(CCCc1ccccc1)c1ccco1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.47
MEN1 O00255 2/20 0.47
ALDH1A1 P00352 2/20 0.47
SLC5A2 P31639 1/20 0.47
HSD17B10 Q99714 2/20 0.46
USP2 O75604 1/20 0.46
ALOX15 P16050 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
MIF P14174 1/20 0.45
POLB P06746 3/20 0.43
AGTR1 P30556 1/20 0.43
L3MBTL1 Q9Y468 3/20 0.43
PKM P14618 1/20 0.43
PTPN1 P18031 1/20 0.43
PTPN7 P35236 1/20 0.43
BLM P54132 1/20 0.43
ESR2 Q92731 1/20 0.43
MAPT P10636 1/20 0.43
RECQL P46063 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29636345 0.91 KMT2A (0.49) KMT2AMEN1ALDH1A1SLC5A2HSD17B10
SCHEMBL7578243 0.81 MIF (0.59) KMT2AMEN1SLC5A2HSD17B10USP2
SCHEMBL9764695 0.81 MIF (0.59) KMT2AMEN1SLC5A2HSD17B10USP2
SCHEMBL6576563 0.77 KMT2A (0.44) KMT2AMEN1ALDH1A1SLC5A2HSD17B10
SCHEMBL7278342 0.76 KMT2A (0.48) KMT2AMEN1ALDH1A1SLC5A2POLB
SCHEMBL7292797 0.76 KMT2A (0.48) KMT2AMEN1ALDH1A1SLC5A2POLB
SCHEMBL7292793 0.76 KMT2A (0.48) KMT2AMEN1ALDH1A1SLC5A2POLB
SCHEMBL11319232 0.76 KMT2A (0.42) KMT2AMEN1ALDH1A1SLC5A2HSD17B10
SCHEMBL3184008 0.75 KMT2A (0.45) KMT2AMEN1ALDH1A1SLC5A2HSD17B10
SCHEMBL4575395 0.75 RIPK1 (0.52) L3MBTL1SMN1; SMN2GRIK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US claimed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN claimed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US claimed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed