SCHEMBL23089955

SCHEMBL23089955

OC(c1ccco1)C(c1ccccc1)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.48
POLB P06746 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
PKM P14618 1/20 0.48
PTPN1 P18031 1/20 0.48
PTPN7 P35236 1/20 0.48
BLM P54132 1/20 0.48
ESR2 Q92731 1/20 0.48
CYP2C19 P33261 1/20 0.47
HSD17B10 Q99714 1/20 0.46
HPGD P15428 2/20 0.41
GLA P06280 2/20 0.41
RECQL P46063 1/20 0.41
MEN1 O00255 4/20 0.40
AGTR1 P30556 1/20 0.40
ALDH1A1 P00352 6/20 0.40
AOC3 Q16853 1/20 0.39
KDM4E B2RXH2 3/20 0.39
TSHR P16473 1/20 0.39
MIF P14174 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15272327 0.82 KMT2A (0.58) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL11151822 0.82 KMT2A (0.58) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL15272598 0.82 KMT2A (0.58) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL23089951 0.80 KMT2A (0.46) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL477450 0.78 L3MBTL1 (0.52) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL477460 0.78 L3MBTL1 (0.52) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL17084111 0.75 ALDH1A1 (0.44) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL17084108 0.75 ALDH1A1 (0.44) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL15950891 0.75 ALDH1A1 (0.44) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL11150700 0.75 KMT2A (0.52) KMT2APOLBL3MBTL1PKMPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US claimed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN claimed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US claimed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed