SCHEMBL2316124

SCHEMBL2316124

CCC(N)N1CCN(C(O)CC)CC1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
DPP7 Q9UHL4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3923601 0.85
SCHEMBL636365 0.85 TSHR (0.37)
SCHEMBL2004703 0.85
SCHEMBL268866 0.85 DPP7 (0.32) DPP7
SCHEMBL2850218 0.76 CHRM2 (0.34)
SCHEMBL1404051 0.76 KDM4E (0.35)
SCHEMBL27646786 0.76 GNAI3 (0.34)
SCHEMBL8767704 0.76 KDM4E (0.35)
SCHEMBL689188 0.75
SCHEMBL20780979 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9476019-B2 Cleaning agent for semiconductor provided with metal wiring ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2016-10-25 US claimed
US-20150259632-A1 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING TRUIST BANK, AS NOTES COLLATERAL AGENT 2015-09-17 US claimed
CN-104804903-A Cleaning agent for semiconductor provided with metal wiring ADVANCED TECH MATERIALS 2015-07-29 CN claimed
US-9045717-B2 Cleaning agent for semiconductor provided with metal wiring ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2015-06-02 US claimed
CN-102770524-B cleaning agent for semiconductor with metal wiring ADVANCED TECH MATERIALS 2015-04-22 CN claimed
WO-2013138278-A1 COPPER CLEANING AND PROTECTION FORMULATIONS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-09-19 WO claimed
US-20130203643-A1 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-08-08 US claimed
WO-2011094568-A2 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2011-08-04 WO claimed
US-9476019-B2 Cleaning agent for semiconductor provided with metal wiring ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2016-10-25 US disclosed
US-20150259632-A1 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING TRUIST BANK, AS NOTES COLLATERAL AGENT 2015-09-17 US disclosed
CN-104804903-A Cleaning agent for semiconductor provided with metal wiring ADVANCED TECH MATERIALS 2015-07-29 CN disclosed
US-9045717-B2 Cleaning agent for semiconductor provided with metal wiring ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2015-06-02 US disclosed
CN-102770524-B cleaning agent for semiconductor with metal wiring ADVANCED TECH MATERIALS 2015-04-22 CN disclosed
WO-2013138278-A1 COPPER CLEANING AND PROTECTION FORMULATIONS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-09-19 WO disclosed
US-20130203643-A1 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-08-08 US disclosed
WO-2011094568-A2 CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2011-08-04 WO disclosed