SCHEMBL23208274

SCHEMBL23208274

O=S(=O)(O)c1c(F)c(F)c(OC2CCCCO2)c(F)c1F

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.30
▸ KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8398144 0.80 IDO1 (0.31) MEN1KMT2A
SCHEMBL7714219 0.76 L3MBTL1 (0.30) —
SCHEMBL10087723 0.76 THRA (0.35) KMT2A
SCHEMBL26452192 0.76 MEN1 (0.36) MEN1KMT2A
SCHEMBL17472129 0.76 — —
SCHEMBL7709196 0.76 PTPN1 (0.30) —
SCHEMBL7882138 0.75 — —
SCHEMBL13713607 0.72 CYP19A1 (0.31) —
SCHEMBL11234765 0.70 HTT (0.37) MEN1KMT2A
SCHEMBL23208275 0.69 MEN1 (0.41) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021241292-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 富士フイルム株式会社 2021-12-02 — — WO disclosed
WO-2021065450-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-04-08 — — WO disclosed
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