SCHEMBL23208299

SCHEMBL23208299

O=C(O)c1ccc(-c2cc(F)cc(-c3ccc(C(=O)O)cc3)c2S(=O)(=O)O)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ BCL2L1 Q07817 1/20 0.52
▸ BAD Q92934 1/20 0.52
▸ MAP4K4 O95819 1/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ LMNA P02545 1/20 0.44
▸ HSD17B10 Q99714 1/20 0.44
▸ CA12 O43570 2/20 0.42
▸ CA1 P00915 2/20 0.42
▸ CA2 P00918 2/20 0.42
▸ CA9 Q16790 2/20 0.42
▸ CA14 Q9ULX7 2/20 0.42
▸ TTR P02766 1/20 0.42
▸ GCGR P47871 1/20 0.41
▸ MAPK14 Q16539 1/20 0.41
▸ RXRA P19793 3/20 0.40
▸ RXRB P28702 3/20 0.40
▸ RXRG P48443 1/20 0.40
▸ TP53 P04637 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ SRD5A2 P31213 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23208294 0.83 RXRA (0.56) MAP4K4CA12CA1CA2CA9
SCHEMBL23208298 0.81 LMNA (0.42) KDM4ELMNAHSD17B10MEN1NPC1
SCHEMBL23208302 0.81 FOLH1 (0.46) BCL2L1BADCA12CA1CA2
SCHEMBL1222849 0.74 BCL2L1 (0.62) BCL2L1BADMAP4K4KDM4ELMNA
SCHEMBL30576231 0.73 FOLH1 (0.45) BCL2L1BADKDM4EHSD17B10CA12
SCHEMBL360967 0.72 CDC25B (0.47) BCL2L1BADCA12CA1CA2
SCHEMBL412555 0.72 BCL2L1 (0.72) BCL2L1BADMAP4K4KDM4ELMNA
SCHEMBL2942251 0.71 TSHR (0.63) BCL2L1BADCA12CA1CA2
SCHEMBL23501870 0.71 TSHR (0.63) BCL2L1BADCA12CA1CA2
SCHEMBL411705 0.70 BCL2L1 (0.62) BCL2L1BADMAP4K4KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021065450-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-04-08 — — WO disclosed
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