SCHEMBL23208302

SCHEMBL23208302

O=C(O)c1ccc(-c2cccc(-c3ccc(C(=O)O)cc3)c2S(=O)(=O)O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FOLH1 Q04609 1/20 0.46
▸ CA12 O43570 3/20 0.46
▸ CA1 P00915 3/20 0.46
▸ CA2 P00918 3/20 0.46
▸ CA9 Q16790 3/20 0.46
▸ CA14 Q9ULX7 3/20 0.46
▸ TTR P02766 2/20 0.46
▸ TSHR P16473 2/20 0.44
▸ TP53 P04637 1/20 0.44
▸ BCL2L1 Q07817 1/20 0.42
▸ BAD Q92934 1/20 0.42
▸ DAO P14920 1/20 0.41
▸ NAPRT Q6XQN6 1/20 0.41
▸ CA3 P07451 1/20 0.41
▸ CA6 P23280 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ CA5A P35218 1/20 0.41
▸ CA7 P43166 1/20 0.41
▸ CA5B Q9Y2D0 1/20 0.41
▸ HDAC3 O15379 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21794264 0.82 TSHR (0.46) TSHRBCL2L1HDAC4HDAC2HDAC8
SCHEMBL30576231 0.81 FOLH1 (0.45) FOLH1CA12CA1CA2CA9
SCHEMBL23208294 0.81 RXRA (0.56) CA12CA1CA2CA9CA14
SCHEMBL23208299 0.81 BCL2L1 (0.52) FOLH1CA12CA1CA2CA9
SCHEMBL23433029 0.79 LMNA (0.46) BCL2L1
SCHEMBL28931527 0.78 TSHR (0.55) FOLH1TTRTSHRTP53BCL2L1
SCHEMBL25390971 0.78 TSHR (0.62) FOLH1CA12CA1CA2CA9
Terephthalic Acid SCHEMBL17685563 0.77 ALOX15 (0.52) CA12CA1CA2CA9CA14
SCHEMBL28172468 0.77 PTGS2 (0.50) CYP2C19
SCHEMBL36017 0.76 TSHR (0.59) CA12CA1CA2CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021065450-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-04-08 — — WO disclosed
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