Naphthalene

Naphthalene

SCHEMBL2321089

C1COC1.c1ccc2ccccc2c1

nearest known ligand 0.57

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 6/20 0.57
ALOX12 P18054 1/20 0.57
TSHR P16473 3/20 0.43
LMNA P02545 3/20 0.41
CRHBP P24387 2/20 0.41
CRHR2 Q13324 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
HTT P42858 1/20 0.41
ITGB2 P05107 2/20 0.40
ICAM1 P05362 2/20 0.40
ITGAL P20701 2/20 0.40
KDM4E B2RXH2 1/20 0.38
ALDH1A1 P00352 2/20 0.37
HSD17B10 Q99714 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
POLB P06746 1/20 0.36
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL2464187 0.89 CYP2A6 (0.61) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL28298001 0.89 CYP2A6 (0.61) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL10617947 0.87 ALDH1A1 (0.50) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL9860278 0.86 CYP2A6 (0.57) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL2174111 0.84 ALDH1A1 (0.47) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL2174108 0.84 ALDH1A1 (0.47) CYP2A6ALOX12TSHRLMNACRHBP
Naphthalene SCHEMBL11091198 0.81 CYP2A6 (0.73) CYP2A6ALOX12TSHRITGB2ICAM1
Naphthalene SCHEMBL27762429 0.81 CYP2A6 (0.73) CYP2A6ALOX12TSHRITGB2ICAM1
Naphthalene SCHEMBL10910346 0.81 CYP2A6 (0.73) CYP2A6ALOX12TSHRITGB2ICAM1
Naphthalene SCHEMBL27599321 0.81 CYP2A6 (0.73) CYP2A6ALOX12TSHRITGB2ICAM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9061499-B2 Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-06-23 US disclosed
US-8944580-B2 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-02-03 US disclosed
CN-102741749-B Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2014-10-08 CN disclosed
EP-2531891-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD Canon Kabushiki Kaisha (JP) 2012-12-12 EP disclosed
US-20120306961-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-12-06 US disclosed
CN-102741749-A Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KK 2012-10-17 CN disclosed
US-20120229556-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING STRUCTURAL BODY, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-09-13 US disclosed
WO-2011096552-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING STRUCTURAL BODY, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2011-08-11 WO disclosed
WO-2011096458-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2011-08-11 WO disclosed