Naphthalene

Naphthalene

SCHEMBL28298001

C1CO1.C1CO1.c1ccc2ccccc2c1

nearest known ligand 0.61

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 6/20 0.61
ALOX12 P18054 1/20 0.61
LMNA P02545 3/20 0.50
CRHBP P24387 2/20 0.50
CRHR2 Q13324 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
HTT P42858 1/20 0.50
ITGB2 P05107 2/20 0.42
ICAM1 P05362 2/20 0.42
ITGAL P20701 2/20 0.42
ALDH1A1 P00352 2/20 0.39
HSD17B10 Q99714 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
TSHR P16473 1/20 0.39
POLB P06746 1/20 0.37
CYP1A2 P05177 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CYP3A4 P08684 1/20 0.36
CA7 P43166 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL2464187 1.00 CYP2A6 (0.61) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL9860278 0.96 CYP2A6 (0.57) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL2321089 0.89 CYP2A6 (0.57) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL3804228 0.83 CYP2A6 (0.89) CYP2A6ALOX12ALDH1A1HSD17B10TDP1
Anthracene SCHEMBL29217711 0.83 LMNA (0.50) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL10617947 0.83 ALDH1A1 (0.50) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL2174111 0.81 ALDH1A1 (0.47) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL2174108 0.81 ALDH1A1 (0.47) CYP2A6ALOX12LMNACRHBPCRHR2
Naphthalene SCHEMBL14954290 0.79 CYP2A6 (0.80) CYP2A6ALOX12ALDH1A1HSD17B10TDP1
Naphthalene SCHEMBL28406917 0.79 CYP2A6 (0.80) CYP2A6ALOX12ALDH1A1HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106715761-B Additive for electrolytic refining of high-purity copper and method for producing high-purity copper 三菱综合材料株式会社 2019-06-07 CN disclosed