Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | MGLL | Q99685 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | HBB | P68871 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | GSK3A | P49840 | 1/20 | 0.38 |
| ▸ | GSK3B | P49841 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8985569 | 0.92 | MGLL (0.45) | ALDH1A1MGLLTP53CYP3A4HBB | |
| SCHEMBL22357185 | 0.91 | ALDH1A1 (0.36) | ALDH1A1MGLLHTTTP53CYP3A4 | |
| SCHEMBL24435676 | 0.88 | ALDH1A1 (0.41) | ALDH1A1MGLLTP53CYP3A4GSK3A | |
| SCHEMBL24435675 | 0.88 | ALDH1A1 (0.42) | ALDH1A1MGLLTP53CYP3A4HBB | |
| SCHEMBL24435739 | 0.86 | MGLL (0.42) | ALDH1A1MGLL | |
| SCHEMBL24435678 | 0.85 | MEN1 (0.44) | ALDH1A1MGLLSMN1; SMN2GSK3AGSK3B | |
| SCHEMBL23482910 | 0.85 | ALDH1A1 (0.35) | ALDH1A1MGLLHTTTP53CYP3A4 | |
| SCHEMBL24435674 | 0.85 | ALDH1A1 (0.44) | ALDH1A1MGLLTP53CYP3A4HBB | |
| SCHEMBL24435673 | 0.85 | ALDH1A1 (0.41) | ALDH1A1MGLLTP53CYP3A4HBB | |
| SCHEMBL24630772 | 0.84 | ALDH1A1 (0.42) | ALDH1A1MGLLTP53CYP3A4GSK3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230213857-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-20230205086-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING DIOL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205086-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING DIOL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| US-20220356297-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND | NISSAN CHEMICAL CORPORATION (JP) | 2022-11-10 | — | — | US | disclosed |
| US-20220204686-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| US-20220153920-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| WO-2021070919-A1 | HETEROCYCLIC-COMPOUND-CONTAINING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-04-15 | — | — | WO | disclosed |