SCHEMBL24435673

SCHEMBL24435673

CSCn1c(=O)n(CC(=O)OCC2CO2)c(=O)n(CC(=O)OCC2CO2)c1=O

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
MGLL Q99685 3/20 0.39
TP53 P04637 2/20 0.37
CYP3A4 P08684 1/20 0.37
HBB P68871 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
GSK3A P49840 1/20 0.36
GSK3B P49841 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8985569 0.89 MGLL (0.45) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL23237686 0.85 ALDH1A1 (0.42) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL24435675 0.85 ALDH1A1 (0.42) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL24435676 0.82 ALDH1A1 (0.41) ALDH1A1MGLLTP53CYP3A4GSK3A
SCHEMBL24435674 0.82 ALDH1A1 (0.44) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL24630772 0.81 ALDH1A1 (0.42) ALDH1A1MGLLTP53CYP3A4GSK3A
SCHEMBL24435678 0.80 MEN1 (0.44) ALDH1A1MGLLSMN1; SMN2GSK3AGSK3B
SCHEMBL24435677 0.78 MGLL (0.38) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL22543075 0.78 CYP3A4 (0.46) ALDH1A1MGLLTP53CYP3A4HBB
SCHEMBL24435672 0.78 ALDH1A1 (0.40) ALDH1A1MGLLTP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205086-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING DIOL STRUCTURE NISSAN CHEMICAL CORPORATION (JP) 2023-06-29 US disclosed
US-20230205086-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING DIOL STRUCTURE NISSAN CHEMICAL CORPORATION (JP) 2023-06-29 US disclosed
US-20220356297-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND NISSAN CHEMICAL CORPORATION (JP) 2022-11-10 US disclosed
US-20220153920-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed