SCHEMBL23239261

SCHEMBL23239261

C=CCOC(=O)Cn1c(=O)n(C)c(=O)n(CC(=O)OCC=C)c1=O

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.48
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.40
GSK3A P49840 1/20 0.40
GSK3B P49841 1/20 0.40
HTT P42858 1/20 0.38
KDM4E B2RXH2 1/20 0.38
TDP1 Q9NUW8 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
CYP3A4 P08684 2/20 0.35
MAPT P10636 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
PKM P14618 1/20 0.34
POLB P06746 2/20 0.34
LMNA P02545 1/20 0.34
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21238177 0.91 NPSR1 (0.54) NPSR1ALDH1A1TSHRGSK3AGSK3B
SCHEMBL11763831 0.77 TSHR (0.47) NPSR1ALDH1A1TSHRKDM4ETDP1
SCHEMBL1008759 0.73 ALDH1A1 (0.55) NPSR1ALDH1A1GSK3AGSK3BKDM4E
SCHEMBL11206104 0.73 ALDH1A1 (0.59) NPSR1ALDH1A1TSHRKDM4ETDP1
SCHEMBL23237686 0.71 ALDH1A1 (0.42) ALDH1A1GSK3AGSK3BHTTCYP3A4
SCHEMBL12999586 0.70 HTT (0.39) ALDH1A1GSK3AGSK3BHTTKDM4E
SCHEMBL1006937 0.69 CYP3A4 (0.57) NPSR1ALDH1A1TSHRKDM4EKMT2A
SCHEMBL6864609 0.69 CYP3A4 (0.38) NPSR1ALDH1A1TSHRKDM4ETDP1
SCHEMBL1008039 0.69 CYP3A4 (0.52) NPSR1ALDH1A1TSHRMEN1KMT2A
SCHEMBL15946204 0.69 CYP3A4 (0.52) NPSR1ALDH1A1HTTKMT2ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220356297-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND NISSAN CHEMICAL CORPORATION (JP) 2022-11-10 US disclosed
WO-2021070919-A1 HETEROCYCLIC-COMPOUND-CONTAINING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2021-04-15 WO disclosed