SCHEMBL2325762

SCHEMBL2325762

CC(O)c1cccn1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL732708 0.80
SCHEMBL13257731 0.79
SCHEMBL4884620 0.76
SCHEMBL26290734 0.76 MAOB (0.41)
SCHEMBL26985723 0.76
SCHEMBL26466710 0.76
SCHEMBL23053214 0.76 LMNA (0.45)
SCHEMBL14827559 0.76 MAOB (0.45)
SCHEMBL7477619 0.76 PTGS2 (0.45)
SCHEMBL11384211 0.76 MAOB (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1835995-B Polyelectrolyte composition for humidity sensor, polyelectrolyte ink, and method for preparing polyelectrolyte membrane for sensor by inkjet printing HAEUN CHEMTEC CO LTD 2010-05-26 CN claimed
CN-1835995-A Polyelectrolyte composition for humidity sensor, polyelectrolyte ink, and method for preparing polyelectrolyte membrane for sensor by inkjet printing HAEUN CHEMTEC CO LTD (KR) 2006-09-20 CN claimed
JP-53005159-A None JP disclosed
US-20170333437-A1 COMPOUNDS AND COMPOSITIONS FOR THE TREATMENT OF PARASITIC DISEASES NOVARTIS INSTITUTE FOR FUNCTIONAL GENOMICS, INC., DBA GENOMICS INSTITUTE OF THE NOVARTIS RESEARCH FOUNDATION 2017-11-23 US disclosed
US-8808975-B2 Positive resist composition for immersion exposure and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
EP-1764647-B1 Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same FUJIFILM CORP (JP) 2011-08-17 EP disclosed
US-20100310991-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-09 US disclosed
US-7803511-B2 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJIFILM CORPORATION (JP) 2010-09-28 US disclosed
CN-1835995-B Polyelectrolyte composition for humidity sensor, polyelectrolyte ink, and method for preparing polyelectrolyte membrane for sensor by inkjet printing HAEUN CHEMTEC CO LTD 2010-05-26 CN disclosed
EP-0819000-B1 NODULISPORIC ACID DERIVATIVES MERCK & CO INC (US) 2009-07-08 EP disclosed
EP-1764647-A2 Positive resist composition for immersion exposure and pattern-forming method using the same FUJIFILM Corporation (JP) 2007-03-21 EP disclosed
US-5817651-A ANALGESICS, RHEUMATIC DISEASES, ANTIINFLAMMATORY AGENTS SANOFI (FR) 1998-10-06 US disclosed
EP-0819000-A1 NODULISPORIC ACID DERIVATIVES Merck & Co., Inc. (US) 1998-01-21 EP disclosed
US-5607933-A METHODS FOR TREATMENT OF GLAUCOMA AND FOR RELIEF OF PAIN AND RHEUMATIC AND INFLAMMATORY CONDITIONS BY ADMINISTERING THE INDOLES; N-HETERYL IS 2-PIPERAZINYL STERLING WINTHROP INC. (US) 1997-03-04 US disclosed
WO-1996029073-A1 NODULISPORIC ACID DERIVATIVES MERCK & CO., INC. (US) 1996-09-26 WO disclosed
CN-1102640-A Alpha, omega-diarylalkane derivatives, their preparation and their use in the treatment and prevention of circulatory and psychiatric disorders SANKYO CO (JP) 1995-05-17 CN disclosed
US-5324737-A Analgesics, antirheumatic and antiinflammatory agents, glaucoma STERLING WINTHROP INC. (US) 1994-06-28 US disclosed
US-5068234-A Analgesics, rheumatic diseases, antiinflammatory agents or antiglaucoma STERLING DRUG INC. (US) 1991-11-26 US disclosed
EP-0444451-A2 3-Arylcarbonyl-1H-indoles useful as therapeutic agents STERLING WINTHROP INC. (US) 1991-09-04 EP disclosed
JP-S535159-A PREPARATION OF OPTICAL ACTIVE N-METHYL-2-PYRROLIDYLETHANOL TEIJIN LTD 1978-01-18 JP disclosed