SCHEMBL2330968

SCHEMBL2330968

CCCCCCCCCCCCCCCCCCOC(C)CC(C)C

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 1/20 0.47
LPAR3 Q9UBY5 5/20 0.40
LPAR1 Q92633 4/20 0.40
CA1 P00915 8/20 0.39
CA2 P00918 8/20 0.39
CA9 Q16790 7/20 0.39
CA12 O43570 3/20 0.39
CA7 P43166 3/20 0.39
CA14 Q9ULX7 3/20 0.39
LPAR2 Q9HBW0 2/20 0.39
CA3 P07451 2/20 0.39
CA4 P22748 2/20 0.39
CA6 P23280 2/20 0.39
CA5A P35218 2/20 0.39
CA5B Q9Y2D0 2/20 0.39
NAAA Q02083 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1411286 1.00 DNM1 (0.47) DNM1LPAR3LPAR1CA1CA2
SCHEMBL1883777 1.00 DNM1 (0.47) DNM1LPAR3LPAR1CA1CA2
SCHEMBL1411254 1.00 DNM1 (0.47) DNM1LPAR3LPAR1CA1CA2
SCHEMBL18959857 0.91 CYP3A4 (0.37) DNM1CA1CA2
SCHEMBL5163855 0.88 ALDH1A1 (0.32) DNM1
Triethylene Glycol SCHEMBL7770640 0.86 MEN1 (0.61) DNM1LPAR3LPAR1
SCHEMBL497154 0.82 DNM1 (0.42) DNM1LPAR3LPAR1CA1CA2
SCHEMBL8605070 0.82 LMNA (0.39)
SCHEMBL8542544 0.82 DNM1 (0.47) DNM1LPAR3LPAR1CA1CA2
SCHEMBL25544295 0.82 DNM1 (0.47) DNM1LPAR3LPAR1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107405217-A The manufacture method and manufacture device of absorbent commodity piece 尤妮佳股份有限公司 2017-11-28 CN disclosed
CN-102573732-B Method for manufacturing absorbent article 花王株式会社 2016-06-08 CN disclosed
EP-2505173-B1 ABSORBENT ARTICLE KAO CORP (JP) 2016-03-30 EP disclosed
US-8865965-B2 Absorbent article with high and low density portions and skin care agent thereon KAO CORPORATION (JP) 2014-10-21 US disclosed
EP-2505173-A1 ABSORBENT ARTICLE Kao Corporation (JP) 2012-10-03 EP disclosed
US-20120226250-A1 ABSORBENT ARTICLE KAO CORPORATION (JP) 2012-09-06 US disclosed
CN-102573732-A Method for manufacturing absorbent article KAO CORP 2012-07-11 CN disclosed
EP-1444969-B1 Absorbent article KAO CORP (JP) 2011-08-31 EP disclosed
EP-1444970-B1 Absorbent article KAO CORP (JP) 2011-08-17 EP disclosed
US-7781641-B2 Absorbent article KAO CORPORATION (JP) 2010-08-24 US disclosed
EP-1444970-A1 Absorbent article Kao Corporation (JP) 2004-08-11 EP disclosed
EP-1444969-A1 Absorbent article Kao Corporation (JP) 2004-08-11 EP disclosed
CN-1099403-C Novel ether compound and process for producing the same KAO CORP (JP) 2003-01-22 CN disclosed
US-20020022812-A1 Absorbent article KAO CORPORATION (JP) 2002-02-21 US disclosed
EP-1155703-A2 Absorbent article KAO CORPORATION (JP) 2001-11-21 EP disclosed
EP-0825972-B1 NOVEL ETHER COMPOUND AND PROCESS FOR PRODUCING THE SAME KAO CORP (JP) 2001-08-16 EP disclosed
US-6011071-A POLYOXYALKYLENE GLYCOL CAPPED AT ONE END WITH AN A-BRANCHED ALKYL GROUP BEARING AN ALPHA-HYDROGEN ATOM, AND AT THE OTHER END WITH A BRANCHED OR STRAIGHT C10-30 CHAIN ALKYL OR ALKENYL GROUP KAO CORPORATION (JP) 2000-01-04 US disclosed
CN-1184461-A Novel ether compound and process for producing the same KAO CORP (JP) 1998-06-10 CN disclosed
EP-0825972-A1 NOVEL ETHER COMPOUND AND PROCESS FOR PRODUCING THE SAME Kao Corporation (JP) 1998-03-04 EP disclosed
WO-1996036583-A1 NOVEL ETHER COMPOUND AND PROCESS FOR PRODUCING THE SAME KAO CORPORATION (JP) 1996-11-21 WO disclosed