SCHEMBL2331006

SCHEMBL2331006

CCCCc1c(N)c(CCCC)c(CCCC)c(-c2ccc(N)cc2)c1CCCC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GCGR P47871 8/20 0.38
MAPT P10636 2/20 0.37
SKP2 Q13309 1/20 0.37
TLR8 Q9NR97 1/20 0.36
ALDH1A1 P00352 2/20 0.36
TP53 P04637 2/20 0.36
CYP3A4 P08684 2/20 0.36
TDP1 Q9NUW8 1/20 0.36
RAB9A P51151 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
KDM4E B2RXH2 1/20 0.35
MEN1 O00255 1/20 0.35
USP2 O75604 1/20 0.35
GAA P10253 1/20 0.35
HPGD P15428 1/20 0.35
KMT2A Q03164 1/20 0.35
HSD17B10 Q99714 1/20 0.35
DPP4 P27487 1/20 0.35
TSHR P16473 2/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4592873 0.95 GCGR (0.41) GCGRMAPTTLR8ALDH1A1RAB9A
SCHEMBL2382569 0.83 RAB9A (0.46) GCGRMAPTTLR8ALDH1A1RAB9A
SCHEMBL27697130 0.82 SRC (0.45) GCGRMAPTTLR8ALDH1A1RAB9A
SCHEMBL5185158 0.77 SKP2 (0.41) MAPTSKP2TLR8ALDH1A1RAB9A
SCHEMBL7596717 0.76 TDP1 (0.42) GCGRMAPTALDH1A1TP53CYP3A4
Methane SCHEMBL28192521 0.75 TDP1 (0.40) GCGRMAPTALDH1A1TP53CYP3A4
SCHEMBL1513156 0.73 GCGR (0.42) GCGRMAPTTLR8ALDH1A1RAB9A
SCHEMBL9427771 0.73 MAPT (0.45) MAPTSKP2ALDH1A1CYP3A4TDP1
SCHEMBL28433281 0.73 SKP2 (0.39) MAPTSKP2TLR8ALDH1A1RAB9A
Benzidine SCHEMBL28856861 0.73 CYP3A4 (0.61) MAPTTLR8ALDH1A1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1764647-B1 Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same FUJIFILM CORP (JP) 2011-08-17 EP disclosed
EP-1764647-A2 Positive resist composition for immersion exposure and pattern-forming method using the same FUJIFILM Corporation (JP) 2007-03-21 EP disclosed
CN-1289463-C Process for synthesizing benzidine derivatives UNIV TSINGHUA (CN) 2006-12-13 CN disclosed
CN-1702063-A Process for synthesizing benzidine derivatives UNIV TSINGHUA (CN) 2005-11-30 CN disclosed