Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 4/20 | 0.43 |
| ▸ | CA2 | P00918 | 4/20 | 0.43 |
| ▸ | CA12 | O43570 | 3/20 | 0.43 |
| ▸ | CA7 | P43166 | 3/20 | 0.43 |
| ▸ | CA9 | Q16790 | 3/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.42 |
| ▸ | CDC25A | P30304 | 1/20 | 0.42 |
| ▸ | CDC25B | P30305 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | ATIC | P31939 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyromellitic Acid SCHEMBL27405370 | 1.00 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL22982083 | 1.00 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL22127 | 0.96 | ALDH1A1 (0.53) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL22443 | 0.96 | ALDH1A1 (0.53) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL5969075 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL7456153 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL21328420 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL7732131 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL692530 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 | |
| Pyromellitic Acid SCHEMBL11316481 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ALOX15CYP1A2CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0680078-B1 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-03-12 | — | — | EP | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-5630904-A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1997-05-20 | — | — | US | claimed |
| EP-0680078-A2 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-11-02 | — | — | EP | claimed |
| CN-112661594-B | Efficient separation method for acetylene in mixed gas | 太原理工大学 | 2023-04-21 | — | — | CN | disclosed |
| CN-112619611-B | Acetylene efficient separation material | 太原理工大学 | 2022-06-07 | — | — | CN | disclosed |
| CN-112657471-B | Preparation method of low-concentration acetylene efficient trapping agent | 太原理工大学 | 2022-05-20 | — | — | CN | disclosed |
| US-8258221-B2 | Polylactic acid-based resin composition and molded article of polylactic acid-based resin | FUJI XEROX CO., LTD. (JP) | 2012-09-04 | — | — | US | disclosed |
| US-20110207865-A1 | POLYLACTIC ACID-BASED RESIN COMPOSITION AND MOLDED ARTICLE OF POLYLACTIC ACID-BASED RESIN | FUJI XEROX CO., LTD. (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-0680078-B1 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-03-12 | — | — | EP | disclosed |
| US-6265309-B1 | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | MITSUBISHI GAS CHEMICALS CO., INC. (JP) | 2001-07-24 | — | — | US | disclosed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0827188-A2 | Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-03-04 | — | — | EP | disclosed |
| US-5630904-A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1997-05-20 | — | — | US | disclosed |
| EP-0680078-A2 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-11-02 | — | — | EP | disclosed |