SCHEMBL23382530

SCHEMBL23382530

CC1(Oc2ccc(C(=O)OC(c3ccccc3)C(F)(F)C(=O)O)cc2)CCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.39
▸ MAPT P10636 4/20 0.39
▸ MEN1 O00255 4/20 0.39
▸ RAB9A P51151 3/20 0.39
▸ POLB P06746 1/20 0.39
▸ NPC1 O15118 1/20 0.39
▸ FFAR1 O14842 1/20 0.37
▸ NPSR1 Q6W5P4 2/20 0.37
▸ DRD2 P14416 2/20 0.36
▸ ESR1 P03372 1/20 0.36
▸ ESR2 Q92731 1/20 0.36
▸ SLC6A4 P31645 2/20 0.35
▸ SLC6A3 Q01959 2/20 0.35
▸ SLC6A2 P23975 1/20 0.35
▸ PDCD1 Q15116 1/20 0.34
▸ CD274 Q9NZQ7 1/20 0.34
▸ SMN1; SMN2 Q16637 3/20 0.33
▸ MITF O75030 2/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ LMNA P02545 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382532 0.99 KMT2A (0.38) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382475 0.89 ESR1 (0.37) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382821 0.88 ESR1 (0.36) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23383110 0.87 SLC6A2 (0.37) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL24360860 0.87 KMT2A (0.34) KMT2AMAPTMEN1RAB9ANPC1
SCHEMBL23382526 0.87 RAB9A (0.37) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382727 0.86 SLC6A2 (0.38) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382533 0.86 FFAR1 (0.39) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382531 0.86 KMT2A (0.37) KMT2AMAPTMEN1RAB9APOLB
SCHEMBL23382527 0.85 FFAR1 (0.39) KMT2AMAPTMEN1RAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA KMT2A 2537/4885MAPT 2279/4885MEN1 2769/4885
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 KMT2A 2745/4885MAPT 1694/4885MEN1 3334/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 KMT2A 2745/4885MAPT 1694/4885MEN1 3334/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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