SCHEMBL23382823

SCHEMBL23382823

CC(C)C1(OC(=O)c2ccc(C(=O)OC(c3ccccc3)C(F)(F)C(=O)O)cc2)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PDCD1 Q15116 1/20 0.36
▸ CD274 Q9NZQ7 1/20 0.36
▸ ESR1 P03372 1/20 0.36
▸ ESR2 Q92731 1/20 0.36
▸ KMT2A Q03164 5/20 0.35
▸ MEN1 O00255 4/20 0.34
▸ NPC1 O15118 3/20 0.34
▸ MAPT P10636 3/20 0.34
▸ RAB9A P51151 2/20 0.34
▸ POLB P06746 1/20 0.34
▸ LMNA P02545 2/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ HTT P42858 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ CYP1A2 P05177 2/20 0.33
▸ CYP2D6 P10635 2/20 0.33
▸ FFAR1 O14842 1/20 0.33
▸ SCN1A P35498 1/20 0.33
▸ SCN2A Q99250 1/20 0.33
▸ SCN3A Q9NY46 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382831 0.99 PDCD1 (0.36) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382526 0.89 RAB9A (0.37) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382531 0.88 KMT2A (0.37) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382475 0.86 ESR1 (0.37) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382821 0.85 ESR1 (0.36) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382829 0.83 FFAR1 (0.36) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382813 0.83 PDCD1 (0.33) PDCD1CD274KMT2AMEN1NPC1
SCHEMBL23382830 0.83 FFAR1 (0.36) PDCD1CD274ESR1ESR2KMT2A
SCHEMBL23382819 0.82 PDCD1 (0.33) PDCD1CD274KMT2AMEN1LMNA
SCHEMBL24361051 0.79 TSHR (0.49) PDCD1CD274ESR1ESR2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 PDCD1 2035/4885CD274 2816/4885ESR1 3005/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 PDCD1 2035/4885CD274 2816/4885ESR1 3005/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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