SCHEMBL23383014

SCHEMBL23383014

CC(C)(C)OC(=O)c1ccccc1C(=O)OCC(F)(F)C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 8/20 0.45
▸ NPSR1 Q6W5P4 2/20 0.43
▸ MEN1 O00255 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ ALDH1A1 P00352 5/20 0.42
▸ TDP1 Q9NUW8 3/20 0.41
▸ L3MBTL1 Q9Y468 3/20 0.41
▸ CRHBP P24387 1/20 0.40
▸ CRHR2 Q13324 1/20 0.40
▸ MAPK1 P28482 3/20 0.40
▸ CYP3A4 P08684 3/20 0.40
▸ TP53 P04637 1/20 0.40
▸ HIF1A Q16665 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ AAK1 Q2M2I8 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ ADRA1A P35348 1/20 0.38
▸ ADRA1B P35368 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4625710 0.83 TSHR (0.52) TSHRNPSR1MEN1KMT2AALDH1A1
SCHEMBL23382489 0.82 MAPK1 (0.45) TSHRKMT2AALDH1A1TDP1MAPK1
Hydrogen Peroxide SCHEMBL29048859 0.80 TSHR (0.48) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL23559296 0.79 MAPK1 (0.41) TSHRNPSR1MEN1KMT2AALDH1A1
SCHEMBL30111657 0.79 TSHR (0.50) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL109178 0.79 TSHR (0.50) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL27812272 0.78 TSHR (0.75) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL23382486 0.77 TSHR (0.38) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL26189857 0.77 ALDH1A1 (0.68) TSHRNPSR1KMT2AALDH1A1TDP1
SCHEMBL26343031 0.77 CDC25B (0.50) KMT2AALDH1A1L3MBTL1KDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 TSHR 3502/4885NPSR1 3275/4885MEN1 3334/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 TSHR 3502/4885NPSR1 3275/4885MEN1 3334/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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