SCHEMBL234050

SCHEMBL234050

CCN[Si](C)(NCC)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
KCNN4 O15554 1/20 0.38
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.36
KDM4E B2RXH2 3/20 0.34
ALDH1A1 P00352 2/20 0.34
HPGD P15428 2/20 0.34
GAA P10253 2/20 0.34
SIGMAR1 Q99720 1/20 0.34
MAPT P10636 4/20 0.34
ELANE P08246 2/20 0.34
HTT P42858 1/20 0.33
NPC1 O15118 1/20 0.32
PKM P14618 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32
NR1H2 P55055 1/20 0.31
NR1H3 Q13133 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2273250 0.80 ESR1 (0.38) ESR1ESR2KCNN4LMNATP53
SCHEMBL233708 0.77 KCNN4 (0.39) ESR1ESR2KCNN4LMNATP53
SCHEMBL2268924 0.77 KCNN4 (0.39) ESR1ESR2KCNN4LMNATP53
SCHEMBL2102177 0.77 KCNN4 (0.39) ESR1ESR2KCNN4LMNATP53
SCHEMBL2272353 0.76 ESR1 (0.35) ESR1ESR2KCNN4LMNATP53
SCHEMBL2100216 0.76 ESR1 (0.40) ESR1ESR2KCNN4LMNATP53
SCHEMBL235043 0.74 ESR1 (0.41) ESR1ESR2KCNN4LMNAKDM4E
SCHEMBL2099561 0.73 KCNN4 (0.37) ESR1ESR2KCNN4LMNATP53
SCHEMBL2099500 0.73 KCNN4 (0.37) ESR1ESR2KCNN4LMNATP53
SCHEMBL2103096 0.73 KCNN4 (0.41) ESR1ESR2KCNN4LMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US claimed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP claimed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO claimed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US claimed
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US disclosed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP disclosed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO disclosed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US disclosed
EP-2360190-B1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO LTD (JP) 2015-10-14 EP disclosed
US-8648001-B2 Aminosilane compounds, catalyst components and catalysts for olefin polymerization, and process for production of olefin polymers with the same TOHO TITANIUM CO., LTD. (JP) 2014-02-11 US disclosed
US-8426537-B2 Solid catalyst component and catalyst for polymerization of olefins, and process for production of olefin polymers using same TOHO TITANIUM CO., LTD. (JP) 2013-04-23 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20120053310-A1 Aminosilane Compounds, Catalyst Components and Catalysts for Olefin Polymerization, and Process for Production of Olefin Polymers with the Same TOHO TITANIUM CO., LTD. (JP) 2012-03-01 US disclosed
US-20120004378-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO., LTD (JP) 2012-01-05 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-2360190-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME Toho Titanium CO., LTD. (JP) 2011-08-24 EP disclosed
US-20100190942-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME TOHO CATALYST CO., LTD. (JP) 2010-07-29 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
EP-1908767-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME Toho Catalyst Co., Ltd. (JP) 2008-04-09 EP disclosed