SCHEMBL23429992

SCHEMBL23429992

CC(C)(c1ccc(C(C)(C(F)(F)F)C(F)(F)F)cc1)C(F)(F)F

nearest known ligand 0.54

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
PDE2A O00408 1/20 0.54
NR1I2 O75469 1/20 0.36
RORC P51449 1/20 0.36
NR1H2 P55055 4/20 0.33
NR1H3 Q13133 4/20 0.33
KIF11 P52732 1/20 0.32
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
TSHR P16473 1/20 0.31
TRPV1 Q8NER1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17232307 0.89 NR1I2 (0.40) PDE2ANR1I2RORCNR1H2NR1H3
SCHEMBL21846673 0.81 TSHR (0.50) NR1I2RORCKIF11TSHRTRPV1
SCHEMBL13025956 0.81 KIF11 (0.44) PDE2ANR1I2RORCNR1H2NR1H3
SCHEMBL10183591 0.81 PDE2A (0.56) PDE2AKIF11TSHRTRPV1
SCHEMBL12597559 0.79 TSHR (0.55) PDE2ANR1H2NR1H3KIF11TSHR
SCHEMBL14438866 0.79 TSHR (0.55) PDE2ANR1I2RORCNR1H2NR1H3
SCHEMBL1147216 0.77 PDE2A (0.57) PDE2AKIF11
SCHEMBL1246028 0.77 ESR1 (0.58) PDE2AKIF11ESR1ESR2TSHR
SCHEMBL517476 0.77 PDE2A (0.52) PDE2ANR1H2NR1H3KIF11ESR1
SCHEMBL4600929 0.76 ALDH1A1 (0.52) PDE2AKIF11ESR1ESR2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220019146-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-20 US disclosed
US-20210405529-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-12-30 US disclosed
US-20210278767-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-09-09 US disclosed
US-20210165327-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210165327-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN RALA, MRPL19, MRPL9 PDE2A 3571/4885NR1I2 2861/4885RORC 3579/4885
US-20220019146-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN LIPA, MLLT3, EPB41L2 PDE2A 3272/4885NR1I2 3299/4885RORC 4737/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.