Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL722700 | 0.75 | — | — | |
| SCHEMBL15309774 | 0.73 | MEN1 (0.30) | MEN1CYP1A2KMT2A | |
| SCHEMBL232592 | 0.73 | MEN1 (0.30) | MEN1CYP1A2KMT2A | |
| SCHEMBL231442 | 0.71 | OPRM1 (0.35) | MEN1KMT2A | |
| SCHEMBL254360 | 0.71 | — | — | |
| SCHEMBL235628 | 0.71 | — | — | |
| SCHEMBL233296 | 0.67 | — | — | |
| SCHEMBL27966957 | 0.67 | — | — | |
| SCHEMBL235790 | 0.67 | — | — | |
| SCHEMBL235220 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| US-12049576-B2 | Silicone pressure sensitive adhesive and method of making the same | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-07-30 | — | — | US | claimed |
| EP-4320180-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | Momentive Performance Materials Inc. (US) | 2024-02-14 | — | — | EP | claimed |
| CN-117377716-A | Organosilicon pressure-sensitive adhesive and method for preparing same | 迈图高新材料公司 | 2024-01-09 | — | — | CN | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| WO-2022216482-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-10-13 | — | — | WO | claimed |
| US-20220325154-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2022-10-13 | — | — | US | claimed |
| US-20210363639-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2021-11-25 | — | — | US | claimed |
| EP-3902939-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | Versum Materials US, LLC (US) | 2021-11-03 | — | — | EP | claimed |
| CN-113383108-A | Deposition of carbon-doped silicon oxide | 弗萨姆材料美国有限责任公司 | 2021-09-10 | — | — | CN | claimed |
| EP-3844319-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2021-07-07 | — | — | EP | claimed |
| CN-112969816-A | Compositions for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| WO-2020163359-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | VERSUM MATERIALS US, LLC (US) | 2020-08-13 | — | — | WO | claimed |
| US-20200248309-A1 | Deposition Of Carbon Doped Silicon Oxide | VERSUM MATERIALS US, LLC (US) | 2020-08-06 | — | — | US | claimed |
| WO-2020072768-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2020-04-09 | — | — | WO | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| EP-1908767-A1 | AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME | Toho Catalyst Co., Ltd. (JP) | 2008-04-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11649547-B2 | Deposition of carbon doped silicon oxide | ESRRG, ESRRB, DNMT3B | MEN1 2610/4885CYP1A2 125/4885KMT2A 270/4885 |
| US-20200248309-A1 | Deposition Of Carbon Doped Silicon Oxide | ESRRG, ESRRB, DNMT3B | MEN1 2610/4885CYP1A2 125/4885KMT2A 270/4885 |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | NOS2, SFN, DSTYK | MEN1 3073/4885CYP1A2 499/4885KMT2A 596/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.