SCHEMBL23519043

SCHEMBL23519043

O=C(CSCC(=O)Oc1c(I)cc(I)cc1I)OCCOC(F)(F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23519002 0.76 PLAU (0.30) —
SCHEMBL23518999 0.70 ESR1 (0.37) —
SCHEMBL26343100 0.69 POLB (0.32) —
SCHEMBL23519003 0.67 NOTUM (0.36) —
SCHEMBL24360854 0.65 VCAM1 (0.32) —
SCHEMBL7875529 0.64 TTR (0.40) —
SCHEMBL19678495 0.64 THRA (0.36) —
SCHEMBL24361857 0.63 VCAM1 (0.37) —
SCHEMBL19846377 0.63 ACP1 (0.32) —
SCHEMBL19846328 0.63 LMNA (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210179554-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-17 — — US disclosed
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