SCHEMBL235280

SCHEMBL235280

CO[Si](C)(C)CCCC#N

nearest known ligand 0.40

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2501147 0.85
SCHEMBL3889553 0.83 TSHR (0.42) TSHRALDH1A1TDP1
SCHEMBL387611 0.81 TSHR (0.40) TSHRALDH1A1TDP1
SCHEMBL3151863 0.79 TSHR (0.39) TSHRALDH1A1TDP1
SCHEMBL1584800 0.78 TSHR (0.42) TSHRALDH1A1TDP1
SCHEMBL126260 0.78 TSHR (0.42) TSHRALDH1A1TDP1
SCHEMBL2864681 0.77 TSHR (0.42) TSHR
SCHEMBL28670030 0.77 TSHR (0.33) TSHR
SCHEMBL648313 0.76
SCHEMBL703801 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108231573-B Etching composition and method for manufacturing semiconductor device by using the same 三星电子株式会社 2024-01-16 CN claimed
CN-113563720-B Modified phthalonitrile resin and preparation method thereof 哈尔滨工业大学 2023-05-09 CN claimed
CN-113563720-A Modified phthalonitrile resin and preparation method thereof 哈尔滨工业大学 2021-10-29 CN claimed
CN-111185978-A Hang podium wall body fire resistive construction 温州职业技术学院 2020-05-22 CN claimed
US-10414978-B2 Etching composition and method for fabricating semiconductor device by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-09-17 US claimed
CN-107415007-B A kind of functionality Wood treatment method 浙江润格木业科技有限公司 2019-01-15 CN claimed
US-20180163130-A1 ETCHING COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-06-14 US claimed
EP-1634885-A1 Process for preparing primary aminoorganosilanes General Electric Company (US) 2006-03-15 EP claimed
WO-1992005433-A1 CONTINUOUS POSITIVE CHARGE CAPILLARY COLUMNS USED IN CAPILLARY ELECTROPHORESIS KERR ROBERT (FR) 1992-04-02 WO claimed
US-20250026962-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2025-01-23 US disclosed
US-12163058-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-12-10 US disclosed
US-12146076-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-11-19 US disclosed
US-12012525-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-06-18 US disclosed
US-11912902-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-02-27 US disclosed
US-6025202-A PROCESS FOR DETECTING AND QUANTIFYING AN AMOUNT OF A CHEMICAL COMPOUND IN A CARRIER BY SUBJECTING SAMPLE TO RAMAN SPECTROSCOPY THE PENN STATE RESEARCH FOUNDATION (US) 2000-02-15 US disclosed
WO-1998010289-A9 SELF-ASSEMBLED METAL COLLOID MONOLAYERS 1998-05-22 WO disclosed
WO-1998010289-A1 SELF-ASSEMBLED METAL COLLOID MONOLAYERS THE PENN STATE RESEARCH FOUNDATION (US) 1998-03-12 WO disclosed
US-5609907-A SURFACE ENHANCED RAMAN SCATTERING THE PENN STATE RESEARCH FOUNDATION (US) 1997-03-11 US disclosed
US-5480919-A Functional polyorganosiloxane emulsions from monohydrolyzable silanes and photo curable compositions therefrom DOW CORNING CORPORATION (US) 1996-01-02 US disclosed
WO-1992005433-A1 CONTINUOUS POSITIVE CHARGE CAPILLARY COLUMNS USED IN CAPILLARY ELECTROPHORESIS KERR ROBERT (FR) 1992-04-02 WO disclosed