⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703801 | 0.93 | — | — | |
| SCHEMBL13089578 | 0.91 | — | — | |
| SCHEMBL557306 | 0.90 | — | — | |
| SCHEMBL931332 | 0.90 | — | — | |
| SCHEMBL2956125 | 0.90 | — | — | |
| SCHEMBL9785099 | 0.90 | — | — | |
| SCHEMBL3229729 | 0.90 | — | — | |
| SCHEMBL2860349 | 0.88 | — | — | |
| SCHEMBL1887028 | 0.88 | LMNA (0.39) | — | |
| SCHEMBL5027533 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4570877-A1 | SURFACE TREATMENT AGENT | DAIKIN INDUSTRIES, LTD. (JP) | 2025-06-18 | — | — | EP | disclosed |
| CN-119698451-A | Surface treating agent | 大金工业株式会社 | 2025-03-25 | — | — | CN | disclosed |
| EP-4509551-A1 | SURFACE TREATMENT AGENT | DAIKIN INDUSTRIES, LTD. (JP) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025028568-A1 | SURFACE TREATMENT AGENT | ダイキン工業株式会社 | 2025-02-06 | — | — | WO | disclosed |
| CN-119053645-A | Surface treating agent | 大金工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| WO-2024034668-A1 | SURFACE TREATMENT AGENT | ダイキン工業株式会社 | 2024-02-15 | — | — | WO | disclosed |
| WO-2023204276-A1 | SURFACE TREATMENT AGENT | ダイキン工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-11592945-B2 | Dielectric siloxane particle films and devices having the same | INKRON OY (FI) | 2023-02-28 | — | — | US | disclosed |
| CN-106605309-B | LED lamp, manufacturing method of LED lamp and sealing method of LED device | 英克伦股份有限公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-106661227-B | Dielectric film and manufacturing method thereof, display and manufacturing method thereof, composition and touch panel | 英克伦股份有限公司 | 2022-07-22 | — | — | CN | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |