⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7263173 | 0.81 | MGAM (0.39) | — | |
| SCHEMBL27538432 | 0.81 | TSHR (0.37) | — | |
| SCHEMBL10551912 | 0.77 | — | — | |
| SCHEMBL19638975 | 0.77 | — | — | |
| SCHEMBL5037696 | 0.77 | — | — | |
| SCHEMBL17439186 | 0.77 | MGAM (0.55) | — | |
| SCHEMBL717238 | 0.75 | — | — | |
| Ammonia Solution, Strong SCHEMBL10611782 | 0.75 | TSHR (0.46) | — | |
| SCHEMBL28286077 | 0.75 | TSHR (0.52) | — | |
| SCHEMBL7263177 | 0.75 | LDHA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2360195-B1 | PHOTO-CURING MATERIAL MANUFACTURING METHOD, AND PHOTO-CURING MATERIAL AND ARTICLE | ASAHI GLASS CO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-8207242-B2 | Process for producing photocurable material, photocurable material and article | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20110237703-A1 | PROCESS FOR PRODUCING PHOTOCURABLE MATERIAL, PHOTOCURABLE MATERIAL AND ARTICLE | ASAHI GLASS COMPANY, LIMITED (JP) | 2011-09-29 | — | — | US | disclosed |
| EP-2360195-A1 | PHOTO-CURING MATERIAL MANUFACTURING METHOD, AND PHOTO-CURING MATERIAL AND ARTICLE | Asahi Glass Company Limited (JP) | 2011-08-24 | — | — | EP | disclosed |