SCHEMBL23559444

SCHEMBL23559444

CC(C)C(OC(=O)c1ccc(I)cc1Cl)C(F)(F)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HPGD P15428 3/20 0.35
▸ MAP2K1 Q02750 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ LMNA P02545 4/20 0.34
▸ MAPT P10636 4/20 0.34
▸ GAA P10253 3/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ CA12 O43570 1/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA2 P00918 1/20 0.31
▸ CA7 P43166 1/20 0.31
▸ CA9 Q16790 1/20 0.31
▸ CA14 Q9ULX7 1/20 0.31
▸ THRB P10828 1/20 0.31
▸ PKM P14618 2/20 0.31
▸ PDK2 Q15119 1/20 0.31
▸ NPC1 O15118 1/20 0.30
▸ RAB9A P51151 1/20 0.30
▸ KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23559268 0.87 CA12 (0.33) CA12CA1CA2CA7CA9
SCHEMBL26312665 0.86 CA12 (0.43) SMN1; SMN2LMNAMAPTGAACA12
SCHEMBL23559443 0.85 CES2 (0.33) HPGDALDH1A1SMN1; SMN2LMNAMAPT
SCHEMBL23559367 0.84 PTPN1 (0.33) MAP2K1
SCHEMBL24361153 0.84 CA12 (0.43) HPGDALDH1A1MAPTKDM4ECA12
SCHEMBL23559371 0.84 NOTUM (0.33) NOTUM
SCHEMBL26312664 0.82 SMN1; SMN2 (0.39) ALDH1A1SMN1; SMN2LMNAMAPTGAA
SCHEMBL23559247 0.79 MAP2K1 (0.36) HPGDMAP2K1ALDH1A1SMN1; SMN2LMNA
SCHEMBL22451781 0.79 PDCD1 (0.40) ALDH1A1SMN1; SMN2LMNACA12CA1
SCHEMBL23559372 0.78 CA12 (0.35) ALDH1A1SMN1; SMN2MAPTCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-24 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SLC6A5, LIFR, SLC6A9 HPGD 3774/4885MAP2K1 666/4885ALDH1A1 4242/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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