SCHEMBL23559473

SCHEMBL23559473

CC(C)(OC(=O)c1cc(I)cc(I)c1O)C(F)(F)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.39
▸ ERN1 O75460 1/20 0.32
▸ CFTR P13569 1/20 0.31
▸ CYP1A2 P05177 1/20 0.31
▸ CYP2C9 P11712 1/20 0.31
▸ HIF1A Q16665 1/20 0.31
▸ HSD17B10 Q99714 1/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ HSPD1 P10809 1/20 0.31
▸ PNLIP P16233 1/20 0.31
▸ PIK3CA P42336 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ BLM P54132 1/20 0.31
▸ HSPE1 P61604 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ VCAM1 P19320 1/20 0.30
▸ ESR1 P03372 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23559564 0.87 SOS1 (0.33) CFTR
SCHEMBL24361458 0.85 TTR (0.36) TTR
SCHEMBL23559253 0.84 TPMT (0.35) CFTR
SCHEMBL26343085 0.83 TTR (0.36) TTRMEN1HSPD1PNLIPPIK3CA
SCHEMBL23559562 0.82 TTR (0.31) TTRCFTR
SCHEMBL23559310 0.82 ESR1 (0.42) TTRCFTRMEN1BLMKMT2A
SCHEMBL23559561 0.82 GABRG2 (0.32) CFTR
SCHEMBL23559322 0.81 HPGD (0.32) CFTRHSD17B10
SCHEMBL23559325 0.81 POLB (0.33) VCAM1
SCHEMBL23559319 0.81 CA12 (0.36) ERN1CYP1A2HSD17B10MEN1BLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 — — US disclosed
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-24 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA TTR 4772/4885ERN1 2130/4885CFTR 1884/4885
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SLC6A5, LIFR, SLC6A9 TTR 4845/4885ERN1 1723/4885CFTR 2281/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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