Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2100956 | 0.81 | TP53 (0.32) | TP53 | |
| SCHEMBL2101198 | 0.76 | TSHR (0.38) | — | |
| SCHEMBL233844 | 0.72 | ADH1B (0.36) | — | |
| SCHEMBL722659 | 0.72 | TP53 (0.35) | TP53 | |
| SCHEMBL236324 | 0.69 | TP53 (0.31) | TP53 | |
| SCHEMBL888418 | 0.69 | TP53 (0.31) | TP53 | |
| SCHEMBL5403964 | 0.69 | TP53 (0.31) | TP53 | |
| SCHEMBL234201 | 0.67 | TSHR (0.41) | TP53MEN1GLACYP2C19KMT2A | |
| SCHEMBL235878 | 0.67 | ADH1B (0.32) | TP53 | |
| SCHEMBL182151 | 0.67 | TP53 (0.36) | TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12049576-B2 | Silicone pressure sensitive adhesive and method of making the same | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-07-30 | — | — | US | claimed |
| EP-4320180-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | Momentive Performance Materials Inc. (US) | 2024-02-14 | — | — | EP | claimed |
| WO-2022216482-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-10-13 | — | — | WO | claimed |
| US-20220325154-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2022-10-13 | — | — | US | claimed |
| CN-119604963-A | Hybrid atomic layer deposition | 朗姆研究公司 | 2025-03-11 | — | — | CN | disclosed |
| CN-119487614-A | Deposition and etching of silicon-containing layers | 朗姆研究公司 | 2025-02-18 | — | — | CN | disclosed |
| US-12049576-B2 | Silicone pressure sensitive adhesive and method of making the same | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-07-30 | — | — | US | disclosed |
| EP-4320180-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | Momentive Performance Materials Inc. (US) | 2024-02-14 | — | — | EP | disclosed |
| US-20240030026-A1 | PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2024-01-25 | — | — | US | disclosed |
| CN-117121172-A | Method for manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and program | 株式会社国际电气 | 2023-11-24 | — | — | CN | disclosed |
| WO-2022264430-A1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND PROGRAM | 株式会社KOKUSAI ELECTRIC | 2022-12-22 | — | — | WO | disclosed |
| WO-2022216482-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-10-13 | — | — | WO | disclosed |
| US-20120004378-A1 | SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME | TOHO TITANIUM CO., LTD (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-2360190-A1 | SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME | Toho Titanium CO., LTD. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20100190942-A1 | AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME | TOHO CATALYST CO., LTD. (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-1908767-A1 | AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME | Toho Catalyst Co., Ltd. (JP) | 2008-04-09 | — | — | EP | disclosed |
| US-5770661-A | Polycarbodiimide derivative and process for producing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0785222-A2 | Polycarbodiimide derivative and process for producing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-07-23 | — | — | EP | disclosed |