Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.30 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21755763 | 0.84 | NPSR1 (0.35) | MEN1KMT2ANPSR1KDM4EALDH1A1 | |
| SCHEMBL21755766 | 0.78 | SIRT2 (0.38) | MEN1KMT2ANPSR1ALDH1A1SIRT2 | |
| SCHEMBL21755762 | 0.74 | MEN1 (0.35) | MEN1KMT2AALDH1A1 | |
| SCHEMBL21755801 | 0.73 | MEN1 (0.45) | MEN1KMT2ANPSR1ALDH1A1 | |
| SCHEMBL17378267 | 0.71 | NPSR1 (0.52) | MEN1KMT2ANPSR1POLB | |
| SCHEMBL18614335 | 0.71 | SIRT2 (0.38) | MEN1KMT2ANPSR1KDM4EALDH1A1 | |
| SCHEMBL17370910 | 0.69 | NPSR1 (0.46) | MEN1KMT2ANPSR1ALDH1A1SIRT2 | |
| SCHEMBL25706841 | 0.69 | NPSR1 (0.55) | MEN1KMT2ANPSR1POLB | |
| SCHEMBL21755764 | 0.69 | TRPM4 (0.38) | MEN1KMT2ANPSR1KDM4EALDH1A1 | |
| SCHEMBL15998726 | 0.69 | MEN1 (0.41) | MEN1KMT2ANPSR1ALDH1A1SIRT2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3842491-A1 | COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-30 | — | — | EP | disclosed |