SCHEMBL21755801

SCHEMBL21755801

Oc1ccc2ccc3c(c2c1)C(c1cc(I)c(O)c(I)c1)c1c(ccc2ccc(O)cc12)O3

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
ALDH1A1 P00352 1/20 0.45
FGB P02675 1/20 0.45
HPGD P15428 1/20 0.45
TNNI3 P19429 1/20 0.45
TNNT2 P45379 1/20 0.45
RECQL P46063 1/20 0.45
TNNC1 P63316 1/20 0.45
LMNA P02545 1/20 0.43
NPSR1 Q6W5P4 6/20 0.36
CFTR P13569 1/20 0.33
GOPC Q9HD26 1/20 0.33
TTR P02766 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C19 P33261 1/20 0.33
MCL1 Q07820 1/20 0.33
APP P05067 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23960138 0.95 MEN1 (0.42) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL18613172 0.90 MEN1 (0.39) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL21755766 0.90 SIRT2 (0.38) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL21755804 0.86 MEN1 (0.45) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL19842300 0.84 MEN1 (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL23587441 0.83 NPSR1 (0.37) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL18614335 0.81 SIRT2 (0.38) MEN1KMT2AALDH1A1HPGDNPSR1
SCHEMBL22167536 0.81 MEN1 (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL24747280 0.81 MEN1 (0.47) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL17207357 0.81 LMNA (0.51) MEN1KMT2AALDH1A1FGBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-10-28 US disclosed
WO-2020040162-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF MEN1 2710/4885KMT2A 740/4885ALDH1A1 2101/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.