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SCHEMBL21755762

SCHEMBL21755762

Oc1ccc2ccc3c(c2c1)C(c1cc(I)c(O)c(I)c1)c1c(ccc2cc(-c4cc(O)cc5c6c(ccc45)Oc4ccc5ccc(O)cc5c4C6c4cc(I)cc(I)c4O)c(O)cc12)O3

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ FGB P02675 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ TNNI3 P19429 1/20 0.35
▸ TNNT2 P45379 1/20 0.35
▸ RECQL P46063 1/20 0.35
▸ TNNC1 P63316 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21755780 0.81 SIRT2 (0.36) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL21755801 0.81 MEN1 (0.45) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL21755766 0.77 SIRT2 (0.38) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL23960138 0.76 MEN1 (0.42) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL23587377 0.74 MEN1 (0.35) MEN1ALDH1A1KMT2A
SCHEMBL23587438 0.74 — —
SCHEMBL18613172 0.73 MEN1 (0.39) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL23587442 0.72 CA2 (0.33) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL22167539 0.71 MEN1 (0.38) MEN1ALDH1A1FGBHPGDTNNI3
SCHEMBL21755763 0.70 NPSR1 (0.35) MEN1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020040162-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 — — WO disclosed