SCHEMBL236337

SCHEMBL236337

CCCC(CCC)CCC[O]

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
TDP1 Q9NUW8 2/20 0.35
LMNA P02545 1/20 0.35
CA2 P00918 3/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA7 P43166 1/20 0.34
CA14 Q9ULX7 1/20 0.34
CYP3A4 P08684 3/20 0.33
TSHR P16473 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
CHRM1 P11229 1/20 0.32
AKR1A1 P14550 1/20 0.32
CHRM3 P20309 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
ADRA1A P35348 1/20 0.32
HRH1 P35367 1/20 0.32
DRD3 P35462 1/20 0.32
SLC6A3 Q01959 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3098081 0.90 LMNA (0.50) LMNATSHRFDPS
SCHEMBL3097309 0.90 LMNA (0.50) LMNATSHRFDPS
SCHEMBL979077 0.89 CA2 (0.43) ALDH1A1TDP1LMNACA2CA12
SCHEMBL3090859 0.87 ALDH1A1 (0.41) ALDH1A1TDP1LMNACA2CYP3A4
SCHEMBL3088607 0.85 LMNA (0.50) LMNATSHRFDPS
SCHEMBL3098232 0.85 LMNA (0.50) LMNATSHRFDPS
SCHEMBL3090809 0.85 LMNA (0.50) LMNATSHRFDPS
SCHEMBL6813154 0.83 LMNA (0.48) ALDH1A1TDP1LMNACA2CA1
SCHEMBL28881199 0.83 LMNA (0.54) LMNATSHRFDPS
SCHEMBL28346332 0.83 LMNA (0.54) LMNATSHRFDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109721723-B Surfactant, method for producing the same, and solution containing the same 中日合成化学股份有限公司 2021-07-06 CN disclosed
EP-2589058-A1 PHOTOELECTRIC CONVERSION DEVICE COMPRISING HYDROXAMIC ACID DERIVATIVE OR SALT THEREOF AS ADDITIVE AND PROCESS FOR PRODUCING SAME BASF SE (DE) 2013-05-08 EP disclosed
WO-2012001628-A1 PHOTOELECTRIC CONVERSION DEVICE COMPRISING HYDROXAMIC ACID DERIVATIVE OR SALT THEREOF AS ADDITIVE AND PROCESS FOR PRODUCING SAME BASF SE (DE) 2012-01-05 WO disclosed
US-20120000533-A1 PHOTOELECTRIC CONVERSION DEVICE COMPRISING HYDROXAMIC ACID OR A SALT THEREOF AS ADDITIVE AND PROCESS FOR PRODUCING SAME BASF SE (DE) 2012-01-05 US disclosed
US-20110001221-A1 DIELECTRIC LAYER INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2011-01-06 US disclosed
US-7829137-B2 Fabricating dielectric layer INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2010-11-09 US disclosed
US-20070172583-A1 DIELECTRIC LAYER, COMPOSITION AND METHOD FOR FORMING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2007-07-26 US disclosed