SCHEMBL23637639

SCHEMBL23637639

O=C(CBr)OC1(c2ccccc2)CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 3/20 0.44
▸ OPRD1 P41143 3/20 0.44
▸ OPRK1 P41145 3/20 0.44
▸ AKR1C1 Q04828 1/20 0.43
▸ DRD3 P35462 2/20 0.41
▸ HDAC4 P56524 2/20 0.41
▸ MEN1 O00255 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ PRCP P42785 1/20 0.39
▸ SIGMAR1 Q99720 1/20 0.39
▸ MAPK1 P28482 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ POLB P06746 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ LMNA P02545 1/20 0.38
▸ CHRM2 P08172 1/20 0.38
▸ CHRM1 P11229 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25348323 0.85 OPRM1 (0.45) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL26478532 0.84 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3
SCHEMBL22790441 0.84 OPRM1 (0.60) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL26939254 0.84 HDAC4 (0.45) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL28391947 0.84 OPRM1 (0.44) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL28048346 0.83 OPRM1 (0.46) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL26939253 0.82 OPRM1 (0.45) OPRM1OPRD1OPRK1AKR1C1DRD3
SCHEMBL9191673 0.81 AKR1C1 (0.50) OPRM1AKR1C1HDAC4MEN1KMT2A
SCHEMBL9191670 0.81 AKR1C1 (0.50) AKR1C1HDAC4MEN1KMT2ASMN1; SMN2
SCHEMBL4580279 0.80 AKR1C1 (0.46) AKR1C1HDAC4MEN1KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025094825-A1 HETEROPOLYOXOMETALATE HAVING MODIFIED LACUNARY SITE, OR MIXTURE THEREOF 東京応化工業株式会社 2025-05-08 — — WO disclosed
EP-3848756-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2022-07-06 — — EP disclosed
EP-3848756-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-07-14 — — EP disclosed
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