SCHEMBL23637643

SCHEMBL23637643

C1=CCC(C2Nc3ccccc3N2)C=C1

nearest known ligand 0.31

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CREBBP Q92793 3/20 0.31
HSPA1A P0DMV8 1/20 0.30
PTPN7 P35236 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
BRD4 O60885 3/20 0.30
EP300 Q09472 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17196454 0.72
SCHEMBL13784800 0.72 MTNR1A (0.37)
SCHEMBL24611560 0.70 GAA (0.39) CREBBPBRD4
SCHEMBL18994346 0.69
SCHEMBL9079161 0.68
SCHEMBL17376745 0.68 CREBBP (0.42) CREBBPTDP1BRD4EP300
SCHEMBL13445177 0.67 GAA (0.34)
SCHEMBL22418279 0.66
SCHEMBL8620692 0.65 CREBBP (0.37) CREBBPBRD4EP300
SCHEMBL17696862 0.63 NISCH (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3848756-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2022-07-06 EP disclosed
EP-3848756-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-07-14 EP disclosed