⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1687752 | 0.79 | — | — | |
| SCHEMBL825675 | 0.76 | — | — | |
| SCHEMBL17210696 | 0.74 | GABRA1 (0.36) | — | |
| SCHEMBL14422381 | 0.72 | — | — | |
| SCHEMBL2619387 | 0.70 | LMNA (0.37) | — | |
| SCHEMBL20328834 | 0.70 | GABRA1 (0.41) | — | |
| Propofol SCHEMBL28796604 | 0.67 | GABRA1 (0.63) | — | |
| SCHEMBL111876 | 0.67 | — | — | |
| SCHEMBL17452138 | 0.67 | — | — | |
| SCHEMBL8125470 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3848756-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2022-07-06 | — | — | EP | disclosed |
| EP-3848756-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2021-07-14 | — | — | EP | disclosed |