SCHEMBL23640669

SCHEMBL23640669

O=S(=O)(O)C(F)(F)CC12CC3CC(C1)C(C3)C2

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.32
ESR1 P03372 1/20 0.30
CYP2C9 P11712 1/20 0.30
ESR2 Q92731 1/20 0.30
EPHX2 P34913 2/20 0.30
ALDH1A1 P00352 2/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3790410 0.91 ALDH1A1 (0.36) EPHX2ALDH1A1TSHR
SCHEMBL3785565 0.89 ALDH1A1 (0.35) EPHX2ALDH1A1TSHR
SCHEMBL12308108 0.81 EPHX2 (0.37) EPHX2TSHR
SCHEMBL3733833 0.76 MAPT (0.44) HSD11B1ALDH1A1
SCHEMBL16330887 0.75 P2RX7 (0.40) EPHX2
SCHEMBL20086266 0.74 GRIN2D (0.37) EPHX2ALDH1A1TSHR
SCHEMBL18346697 0.74 EPHX2 (0.41) EPHX2ALDH1A1TSHR
SCHEMBL12308110 0.73 MAPT (0.34)
SCHEMBL686224 0.73 GBA2 (0.35) HSD11B1
SCHEMBL26190781 0.73 SCN9A (0.36) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021140909-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2021-07-15 WO disclosed