SCHEMBL23640696

SCHEMBL23640696

C=C(COCC(C)(C)C)C(=O)OC1COC(=O)C1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19056035 0.84 PTPN1 (0.35) PTPN1
SCHEMBL25990999 0.82 PTPN1 (0.35) PTPN1
SCHEMBL15146991 0.82
SCHEMBL92247 0.78 PTPN1 (0.40) PTPN1
SCHEMBL76528 0.74 ALDH1A1 (0.39) PTPN1
SCHEMBL16905047 0.72
SCHEMBL23474733 0.72
SCHEMBL27047575 0.71 PTPN1 (0.36) PTPN1
SCHEMBL17247239 0.71 ALDH1A1 (0.41) PTPN1
SCHEMBL15317767 0.71 PTPN1 (0.38) PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021140909-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2021-07-15 WO disclosed