SCHEMBL17247239

SCHEMBL17247239

C=C(C)C(=O)OCC(=O)C(=O)OC1COC(=O)C1

nearest known ligand 0.41

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41
PTPN1 P18031 1/20 0.33
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL328663 0.88 ALDH1A1 (0.42) ALDH1A1PTPN1TSHRTHRB
SCHEMBL76528 0.85 ALDH1A1 (0.39) ALDH1A1PTPN1
SCHEMBL19101361 0.78 ALDH1A1 (0.38) ALDH1A1PTPN1TSHR
SCHEMBL25990999 0.76 PTPN1 (0.35) PTPN1
SCHEMBL16691271 0.76 PTPN1 (0.38) ALDH1A1PTPN1
SCHEMBL17247220 0.75 PTPN1 (0.38) PTPN1
SCHEMBL17247224 0.74 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL92247 0.74 PTPN1 (0.40) PTPN1
SCHEMBL27047575 0.73 PTPN1 (0.36) PTPN1
SCHEMBL13496330 0.73 PTPN1 (0.36) PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9703195-B2 Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound JSR CORPORATION (JP) 2017-07-11 US disclosed
US-9703195-B2 Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound JSR CORPORATION (JP) 2017-07-11 US disclosed
US-20150323866-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2015-11-12 US disclosed
US-20150323866-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2015-11-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150323866-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND RER1, RPA1, RFT1 ALDH1A1 1025/4885PTPN1 1715/4885TSHR 2997/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.