SCHEMBL23686383

SCHEMBL23686383

CC(=O)Oc1cc(C)c(C(C)(C)C(C)C)c(C)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.40
▸ CYP3A4 P08684 2/20 0.40
▸ ACHE P22303 2/20 0.39
▸ CYP4F2 P78329 1/20 0.39
▸ CYP4A11 Q02928 1/20 0.39
▸ KDM4E B2RXH2 5/20 0.37
▸ GLA P06280 3/20 0.37
▸ GAA P10253 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ TSHR P16473 1/20 0.37
▸ CASP1 P29466 1/20 0.37
▸ CASP7 P55210 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ TTR P02766 1/20 0.37
▸ TP53 P04637 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ BACE1 P56817 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24883663 0.79 ELANE (0.38) LMNAACHEKDM4EGLAGAA
SCHEMBL26085046 0.76 LMNA (0.40) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL14701064 0.76 KMT2A (0.42) LMNACYP3A4ACHEKDM4EGLA
SCHEMBL6364662 0.73 LMNA (0.52) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL23686307 0.71 LMNA (0.52) LMNACYP3A4KDM4EGLAGAA
SCHEMBL23809728 0.71 BACE1 (0.52) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL3688841 0.71 LMNA (0.50) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL27625926 0.71 CYP3A4 (0.48) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL204814 0.70 LMNA (0.48) LMNACYP3A4ACHECYP4F2CYP4A11
SCHEMBL9305290 0.70 LMNA (0.48) LMNACYP3A4ACHECYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11780946-B2 Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-10 — — US disclosed
US-20210230332-A1 ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2021-07-29 — — US disclosed
Send feedback