SCHEMBL237000

SCHEMBL237000

C=C(C)C(=O)N(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3624066 0.80 MEN1 (0.35)
SCHEMBL2210059 0.76 ALDH1A1 (0.43)
SCHEMBL21669507 0.73
SCHEMBL28214326 0.73 TDP1 (0.33)
SCHEMBL8085073 0.73 THRB (0.36)
SCHEMBL5668039 0.72
SCHEMBL6835289 0.72 MEN1 (0.33)
SCHEMBL6835288 0.72 MEN1 (0.33)
SCHEMBL12789353 0.72 MEN1 (0.33)
SCHEMBL1550500 0.72 MLYCD (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119431660-A PH responsive polymer, PH responsive sol, PH responsive gel, preparation method and application 中海油能源发展股份有限公司 2025-02-14 CN claimed
CN-118137070-A Modified diaphragm, battery and preparation method of battery 江苏正力新能电池技术有限公司 2024-06-04 CN claimed
CN-101454277-A Novel materials for lithographic printing plate coatings, lithographic printing plates and coatings comprising these novel materials, and methods of making and using AMERICAN DYE SOURCE INC (CA) 2009-06-10 CN claimed
CN-119431660-A PH responsive polymer, PH responsive sol, PH responsive gel, preparation method and application 中海油能源发展股份有限公司 2025-02-14 CN disclosed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
CN-118137070-A Modified diaphragm, battery and preparation method of battery 江苏正力新能电池技术有限公司 2024-06-04 CN disclosed
EP-3159915-B1 METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET FUJIMI INC (JP) 2023-12-06 EP disclosed
CN-110462797-B Polishing composition 福吉米株式会社 2023-09-22 CN disclosed
CN-116581366-A Battery and method and apparatus for manufacturing the same 珠海冠宇电池股份有限公司 2023-08-11 CN disclosed
CN-114380937-A Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof 江苏博砚电子科技有限公司 2022-04-22 CN disclosed
EP-3133638-B1 COMPOSITION FOR POLISHING SILICON WAFERS FUJIMI INC (JP) 2021-10-27 EP disclosed
EP-1123331-A1 GRAFT COPOLYMER WITH A UREA OR IMID FUNCTIONAL GROUP AS A PIGMENT DISPERSANT E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-08-16 EP disclosed
WO-2001055096-A1 METHOD FOR PRODUCING N-ALKOXY-N-ALKYLAMIDES LONZA AG (CH) 2001-08-02 WO disclosed
WO-2000032564-A1 METHOD OF PRODUCING HYDROXAMIC ACID ESTERS LONZA AG (CH) 2000-06-08 WO disclosed
WO-2000020476-A1 GRAFT COPOLYMER WITH A UREA OR IMID FUNCTIONAL GROUP AS A PIGMENT DISPERSANT E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-04-13 WO disclosed
US-5852123-A Graft copolymer with a urea or imid functional group as a pigment dispersant E. I. DU PONT DE NEMOURS AND COMPANY (US) 1998-12-22 US disclosed
EP-0161804-B1 METHOD FOR MODIFYING THE SURFACE OF POLYMER MATERIALS NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1990-08-01 EP disclosed
US-4708982-A CURED WITH A BLOCK COPOLYMER HAVING FLUORINE GROUPS; WATER AND WEATHER RESISTANT NIPPON OIL AND FATS CO., LTD. (JP) 1987-11-24 US disclosed
EP-0180344-A2 Cured unsaturated polyester resin or vinyl ester resin containing fluorine-containing groups oriented on its surface NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1986-05-07 EP disclosed
EP-0161804-A1 Method for modifying the surface of polymer materials NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1985-11-21 EP disclosed