Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Trimethylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL6424141 | 1.00 | TET2 (0.31) | TET2 | |
| SCHEMBL6931530 | 0.94 | TET2 (0.33) | TET2 | |
| SCHEMBL865345 | 0.91 | — | — | |
| Dimethylamine SCHEMBL11523064 | 0.89 | ALOX15 (0.31) | TET2 | |
| Sulfuric Acid SCHEMBL16196070 | 0.88 | TET2 (0.34) | TET2 | |
| Sulfuric Acid SCHEMBL8404902 | 0.88 | TET2 (0.34) | TET2 | |
| Trimethylammonium SCHEMBL19664269 | 0.86 | ALOX15 (0.34) | TET2 | |
| Trimethylammonium SCHEMBL19664265 | 0.86 | ALOX15 (0.34) | TET2 | |
| Trimethylammonium SCHEMBL69320 | 0.85 | FFAR3 (0.32) | — | |
| Trimethylammonium SCHEMBL1345929 | 0.85 | FFAR3 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8357724-B2 | Method for controlling the stability or the droplets size of simple water-in-oil emulsions, and stabilized simple water-in-oil emulsions | RHODIA CHIMIE (FR) | 2013-01-22 | — | — | US | claimed |
| EP-2209824-B1 | HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES | RHODIA (US) | 2012-08-08 | — | — | EP | claimed |
| EP-1976888-B1 | PROCESS FOR PREPARING A COPOLYMER WITH CONTROLLED ARCHITECTURE, OF TELOMER OR BLOCK COPOLYMER TYPE, OBTAINED FROM VINYL PHOSPHONATE MONOMERS, BY IODINE TRANSFER POLYMERIZATION | RHODIA OPERATIONS (FR) | 2012-06-13 | — | — | EP | claimed |
| US-8025918-B2 | High definition printing with waterborne inks on non-porous substrates | RHODIA, INC. (US) | 2011-09-27 | — | — | US | claimed |
| EP-2209824-A2 | HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES | Rhodia, Inc. (US) | 2010-07-28 | — | — | EP | claimed |
| US-7737237-B2 | Controlled structure copolymer comprising an amphoteric or zwitterionic part | PHODIA CHIMIE (FR) | 2010-06-15 | — | — | US | claimed |
| WO-2009065004-A2 | HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES | RHODIA, INC. (US) | 2009-05-22 | — | — | WO | claimed |
| US-20090130295-A1 | High Definition Printing With Waterborne Inks on Non-Porous Substrates | RHODIA OPERATIONS (FR) | 2009-05-21 | — | — | US | claimed |
| EP-1383813-B1 | USE OF AMPHILIC BLOCK COPOLYMERS IN ORDER TO INCREASE THE WATER AFFINITY OF LOW-ENERGY SURFACES | RHODIA CHIMIE SA (FR) | 2009-04-01 | — | — | EP | claimed |
| EP-1401973-B1 | USE OF AN AMPHIPHILIC BLOCK COPOLYMER AS ADHESION PROMOTERS OF FILM-FORMING AQUEOUS COMPOSITIONS ON A LOW-ENERGY SURFACE | RHODIA CHIMIE SA (FR) | 2008-09-17 | — | — | EP | claimed |
| US-20040082494-A1 | Use of amphilic block copolymers in order to increase the water affinity of low-energy surfaces | RHODIA CHIMIE (FR) | 2004-04-29 | — | — | US | claimed |
| US-20040071871-A1 | Use of an amphiphilic block copolymers as adhesion promoters of film-forming aqueous compositions on a low-energy surface | RHODIA CHIMIE (FR) | 2004-04-15 | — | — | US | claimed |
| EP-0995611-B1 | Ink jet recording element | EASTMAN KODAK CO (US) | 2004-04-07 | — | — | EP | claimed |
| EP-0995610-B1 | Ink jet recording element with overcoat layer | EASTMAN KODAK CO (US) | 2003-12-03 | — | — | EP | claimed |
| US-6089704-A | Overcoat for ink jet recording element | EASTMAN KODAK COMPANY (US) | 2000-07-18 | — | — | US | claimed |
| US-6086985-A | Ink jet recording element | EASTMAN KODAK COMPANY (US) | 2000-07-11 | — | — | US | claimed |
| EP-0995610-A2 | Ink jet recording element with overcoat layer | EASTMAN KODAK COMPANY (US) | 2000-04-26 | — | — | EP | claimed |
| EP-0995611-A2 | Ink jet recording element | EASTMAN KODAK COMPANY (US) | 2000-04-26 | — | — | EP | claimed |
| WO-2020020717-A1 | A MULTI-BLOCK COPOLYMER, PREPARATION PROCESS AND COMPOSITION THEREOF | BASF SE (DE) | 2020-01-30 | — | — | WO | disclosed |
| EP-0995611-A2 | Ink jet recording element | EASTMAN KODAK COMPANY (US) | 2000-04-26 | — | — | EP | disclosed |