Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 8/20 | 0.71 |
| ▸ | KCNMA1 | Q12791 | 3/20 | 0.71 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.71 |
| ▸ | GAA | P10253 | 1/20 | 0.65 |
| ▸ | TP53 | P04637 | 2/20 | 0.55 |
| ▸ | TOP1 | P11387 | 2/20 | 0.54 |
| ▸ | TERT | O14746 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.54 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | TOP2A | P11388 | 1/20 | 0.51 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.51 |
| ▸ | MDM4 | O15151 | 1/20 | 0.51 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10011045 | 0.86 | KCNMA1 (0.57) | HDAC1KCNMA1HDAC2GAATP53 | |
| SCHEMBL5178629 | 0.85 | HDAC1 (0.69) | HDAC1KCNMA1HDAC2GAATP53 | |
| SCHEMBL7817331 | 0.84 | HDAC1 (0.69) | HDAC1KCNMA1HDAC2GAAMEN1 | |
| SCHEMBL12510751 | 0.83 | HDAC1 (0.67) | HDAC1KCNMA1HDAC2GAATP53 | |
| SCHEMBL637477 | 0.83 | KMT2A (0.70) | MEN1MAPTPKMGRIK1KMT2A | |
| SCHEMBL20612888 | 0.83 | HDAC1 (0.68) | HDAC1KCNMA1TP53MEN1MAPT | |
| SCHEMBL12773868 | 0.83 | KCNMA1 (0.72) | HDAC1KCNMA1HDAC2GAAMEN1 | |
| SCHEMBL14476825 | 0.83 | KCNMA1 (1.00) | HDAC1KCNMA1HDAC2GAATP53 | |
| SCHEMBL10873010 | 0.83 | KCNMA1 (1.00) | HDAC1KCNMA1HDAC2GAATP53 | |
| SCHEMBL13213669 | 0.83 | KCNMA1 (0.68) | HDAC1KCNMA1HDAC2GAATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8012676-B2 | Process for preparing conductive material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-09-06 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20090233237-A1 | Process For Preparing Conductive Material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2009-09-17 | — | — | US | disclosed |
| US-7455948-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-7455948-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1970761-A1 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | disclosed |
| EP-0598241-B1 | Lithographic printing material | FUJI PHOTO FILM CO LTD (JP) | 1998-02-04 | — | — | EP | disclosed |
| US-5387483-A | Developer containing silver halide solvent and hydroquinone; has pH up to 11.8 | FUJI PHOTO FILM CO., LTD. (JP) | 1995-02-07 | — | — | US | disclosed |
| EP-0610936-A2 | Lithographic printing material | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-17 | — | — | EP | disclosed |
| EP-0608777-A1 | Processing of lithographic printing material | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-03 | — | — | EP | disclosed |
| EP-0601600-A2 | Processing of lithographic printing material and developer used therein | FUJI PHOTO FILM CO., LTD. (JP) | 1994-06-15 | — | — | EP | disclosed |
| EP-0598241-A1 | Lithographic printing material | FUJI PHOTO FILM CO., LTD. (JP) | 1994-05-25 | — | — | EP | disclosed |
| US-4283478-A | COMPRISING A SILVER HALIDE LAYER AND A LAYER OF POSITIVE WORKING LIGHT SENSITIVE RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 1981-08-11 | — | — | US | disclosed |