SCHEMBL2386695

SCHEMBL2386695

C=CCC(O)(CC=C)c1cccc2ccccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ KDM4E B2RXH2 4/20 0.38
▸ ACP3 P15309 2/20 0.36
▸ CYP1A2 P05177 2/20 0.36
▸ ALDH1A1 P00352 6/20 0.36
▸ TSHR P16473 2/20 0.36
▸ MAPT P10636 2/20 0.36
▸ KIF11 P52732 1/20 0.35
▸ HPGD P15428 4/20 0.34
▸ HSD17B10 Q99714 3/20 0.34
▸ CYP2D6 P10635 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ CYP2C19 P33261 1/20 0.34
▸ HIF1A Q16665 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ ATM Q13315 2/20 0.34
▸ CYP2A6 P11509 1/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ GLA P06280 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15242490 0.83 MAPT (0.45) KMT2AMEN1KDM4EACP3CYP1A2
SCHEMBL21246109 0.80 ALDH1A1 (0.36) KMT2AMEN1KDM4EACP3CYP1A2
SCHEMBL13656366 0.76 ALDH1A1 (0.43) KMT2AKDM4EALDH1A1TSHRMAPT
SCHEMBL11792139 0.76 CYP1A2 (0.40) KMT2AMEN1KDM4EACP3CYP1A2
SCHEMBL15302190 0.75 KMT2A (0.33) KMT2AMEN1KDM4EACP3ALDH1A1
SCHEMBL11500658 0.74 ALDH1A1 (0.44) KMT2AMEN1KDM4EACP3CYP1A2
SCHEMBL12681582 0.74 MAPT (0.41) KMT2AMEN1ALDH1A1TSHRMAPT
SCHEMBL13439639 0.74 MAPT (0.45) KMT2AMEN1KDM4EALDH1A1TSHR
SCHEMBL11500366 0.73 ALDH1A1 (0.43) KMT2AMEN1KDM4EACP3CYP1A2
SCHEMBL28899369 0.73 GABRA1 (0.43) KMT2AMEN1CYP1A2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8017301-B2 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-09-13 — — US disclosed
US-8017301-B2 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-09-13 — — US disclosed
US-8017301-B2 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-09-13 — — US disclosed
US-20090155720-A1 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2009-06-18 — — US disclosed
US-20090155720-A1 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2009-06-18 — — US disclosed
US-20090155720-A1 Photosensitive polymer, resist composition, and associated methods CHEIL INDUSTRIES, INC. (KR) 2009-06-18 — — US disclosed
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