SCHEMBL23870906

SCHEMBL23870906

CC(I)C(=O)Oc1cccc(N)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP3A4 P08684 4/20 0.47
▸ ALDH1A1 P00352 3/20 0.47
▸ TP53 P04637 2/20 0.43
▸ MEN1 O00255 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ MAOB P27338 2/20 0.42
▸ LMNA P02545 2/20 0.39
▸ TSHR P16473 1/20 0.38
▸ ADRB2 P07550 1/20 0.38
▸ ADRB1 P08588 1/20 0.38
▸ ADRB3 P13945 1/20 0.38
▸ ACHE P22303 1/20 0.38
▸ MAPT P10636 2/20 0.38
▸ POLB P06746 1/20 0.38
▸ HSP90AA1 P07900 1/20 0.38
▸ APP P05067 1/20 0.37
▸ ADORA3 P0DMS8 1/20 0.36
▸ CHRM1 P11229 1/20 0.36
▸ TBXA2R P21731 1/20 0.36
▸ SLC6A2 P23975 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27592748 0.86 CYP3A4 (0.50) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL10520830 0.85 CYP3A4 (0.48) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL17980515 0.85 CYP3A4 (0.48) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL25142195 0.83 ALDH1A1 (0.38) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL27642271 0.81 CYP3A4 (0.49) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL26785200 0.79 CYP3A4 (0.46) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL23870908 0.79 ELANE (0.47) CYP3A4ALDH1A1KMT2ALMNATSHR
SCHEMBL27549854 0.78 ALDH1A1 (0.44) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL14911134 0.78 CYP3A4 (0.50) CYP3A4ALDH1A1TP53MEN1KMT2A
SCHEMBL21276510 0.78 ELANE (0.53) ALDH1A1TP53MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 — — US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 — — US disclosed
US-20210405528-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-30 — — US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 — — US disclosed
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